摘要
建立了采用电感耦合等离子体原子发射光谱(ICP-AES)法测定钒铝、铬铝中间合金中铁、硅含量的分析方法。通过对溶样酸选择、基体干扰、加标回收和精密度等实验条件的考察,确定了方法的测定范围为0.010%~0.50%。解决了以往分光光度法测定时操作复杂、费时费力的问题,为大规模生产的质量控制提供了有效的技术,对以后相似合金铁、硅含量的测定提供参考。
Trace impurities of iron(Fe)and silicon(Si)are an important quality indicator of vanadium-aluminum and chromium-aluminum alloys.In this paper,an inductively coupled plasma-atomic emission spectrometry(ICP-AES)method has been developed for the determination of Fe and Si content in vanadium-aluminum and chromium-aluminum master alloys.By selection of optimum conditions,precision in the range of 0.010%-0.50%has been achieved.The presented method is simpler and faster than the conventional spectrophotometric method which is complex and time-consuming,providing effective technical support for the quality control during mass production of vanadium-aluminum and chromium-aluminum alloys.
作者
刘雷雷
朱丽
周凯
孙宝莲
LIU Leilei;ZHU Li;ZHOU Kai;SUN Baolian(Northwest Institute for Nonferrous Metal Research,Xi’an,shaanxi 710016,China)
出处
《中国无机分析化学》
CAS
2018年第1期41-44,共4页
Chinese Journal of Inorganic Analytical Chemistry
关键词
电感耦合等离子体原子发射光谱法
钒铝中间合金
铬铝中间合金
铁
硅
inductive coupled plasma-atomic emission spectrometry(ICP-AES)
vanadium-aluminum master alloy
chromium-aluminum master alloy
iron
silicon
