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多金属层诱导透射紫外“日盲”探测成像滤光片设计与低温制备研究

Design and the preparation of multi metal layer induced transmission UV "solar blind" filter at low temperature for detection imaging
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摘要 基于SiO_2/Al/SiO_2三层夹层结构,结合使用多角度椭圆偏振谱和透射光谱精确反演获得了薄金属Al层光学常数,并研究分析了Al光学常数随膜层厚度的变化;在此基础上采用导纳匹配法,理论优化获得了三腔金属诱导透射紫外滤光膜,并系统分析了Al和SiO_2介质匹配层制备误差对紫外滤光膜光谱性能的影响;进一步采用低温、高真空Al、SiO_2薄膜生长工艺,成功获得了峰值波长位于218 nm附近,峰值透过率~23.1%,带宽~32 nm,在280 nm、318 nm波段的透过率分别约为0.5%和0.04%,400~700 nm、800~1 100 nm波段的截止度分别可达~5.0 OD、~4.5 OD的高性能三腔诱导透射紫外滤光片样品。相关研究结果对于高性能多腔诱导透射"日盲"紫外滤光片的设计与制备具有很好的指导意义。 Based on the basic structural unit of SiO2/Al/SiO2,the optical constants of thin Al films were obtained accurately by fitting the multi angle ellipse polarization spectrum and the transmittance spectrum.And the influences of the thickness of Al film on the optical constants was also studied and analyzed.Theoretically,the three cavity UV induced transmission filter was obtained by using the admittance matching method.And the influence of preparation error of Al and SiO2 dielectric matching layer on the spectral properties of UV filters was systematically analyzed.Based on the low temperature,the high vacuum growth process of Al and SiO2 thin films,the high performance three cavity UV induced transmission filter were successfully prepared.The peak wavelength was located near 218 nm,and the peak transmittance was^23.1%,and the bandwidth was^32 nm.The transmittance in the 280 nm,318 nm bands were about 0.5%and 0.04%,respectively.The cut-off rates of the samples were about 5.0 OD and 4.5 OD in the range of 400-700 nm and 800-1 100 nm,respectively.The results of this study have a good theoretical and practical significance for depositing the visible-near infrared band deep cut-off and UV induced transmission filters.
作者 尚鹏 熊津平 季一勤 刘华松 刘丹丹 庄克文 刘旭 沈伟东 Shang Peng;Xiong Jinping;Ji Yiqin;Liu Huasong;Liu Dandan;Zhuang Kewen;Liu Xu;Shen Weidong(Tianjin Key Laboratory of Optical Thin Film,Tianjin Jinhang Institute of Technical Physics,Tianjin 300308,China;State Key Labs of Modern Optical Instrumentation,Zhejiang University,Hangzhou 310027,China;Chengdu No.7 High School,Chengdu 610209,China)
出处 《红外与激光工程》 EI CSCD 北大核心 2018年第9期174-180,共7页 Infrared and Laser Engineering
基金 国家自然科学基金(61405145 61235011) 天津市自然科学基金(17JCQNJC1900)
关键词 光学薄膜 电子束蒸发 紫外诱导透射 Al/SiO2 thin film electron beam evaporation UV induced filter Al/SiO2
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