摘要
详述了二氯二氢硅与四氯化硅进行反歧化反应制备三氯氢硅技术的研究进展,简述了二氯二氢硅在制备多晶硅、硅烷气、多晶硅薄膜、氮化硅薄膜和二氧化硅薄膜中的应用。
The progress in preparation of trichlorosilane by the anti-disproportionation reaction of dichlorodihydrosilane with silicon tetrachloride was described in detail.The applications of dichlorodi?hydrosilicon in the preparation of polysilicon,silane gas,polysilicon film,silicon nitride film and silicon dioxide film were briefly described.
作者
付绪光
陈其国
吕加南
FU Xuguang;CHEN Qiguo;LYU Jia-nan(Jiangsu Zhongneng Polysilicon Technology Development Co.,Ltd.,Xuzhou 221004,China;National & Local Joint Engineering Research Center of Advanced Silicon Materials Preparation Technology,Xuzhou 221000,China;Jiangsu Engineering Research Center For Polysilicon Material,Xuzhou 221004,China)
出处
《氯碱工业》
CAS
2019年第5期29-32,共4页
Chlor-Alkali Industry
关键词
二氯二氢硅
反歧化反应
三氯氢硅
硅烷
多晶硅
氮化硅薄膜
二氧化硅薄膜
dichlorodihydrosilane
anti-disproportionation reaction
trichlorosilane
silane
polysilicon
silicon nitride film
silicon dioxide film
