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ICP-OES测定镍钴锰氢氧化物中硅含量

Determination of Silicon in Nickel Cobalt Manganese Hydroxide by Inductively Coupled Plasma Atomic Emission Spectrometry
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摘要 采用电感耦合等离子体原子发射光谱仪(ICP-OES)测定镍钴锰三元氢氧化物中硅元素的含量。研究了锰对镍钴锰氢氧化物中硅测试的干扰,发现在最灵敏波长251.611nm下,硅的检测值随着溶液中锰含量的增加而增加,而在次灵敏波长212.412nm下检测,硅的检测值不随溶液中锰含量的变化而变化。该方法检出限为0.014mg/L,相对标准偏差为0.749%,加标回收率为95%~105%之间。因此,镍钴锰氢氧化物中硅测试应使用次灵敏波长212.412nm。 The content of Silicon in the hydroxide of nickel,cobalt and manganese was determined by inductively coupled plasma atomic emission spectrometry (ICP-OES ).The influence of content of manganese to the testing of silicon in the hydroxide of nickel,cobalt and manganese was studied.It was found that the detection value of silicon was risen with the increase of manganese when 251.611 nm was used as the sensitive analytical line.While the detection value of silicon was not different with the variation of manganese when 212.412 nm was used as the hypo-sensitive analytical line.The detection limits were 0.014 mg/L.The certified value was 0.749%.Values of recovery of the method were found in the range of 95%~105%.Therefore,the hypo-sensitive line 212.412 nm was used as the analytical line in the determination of Silicon in the hydroxide of nickel,cobalt and manganese.
作者 周兆海 李沃颖 ZHOU Zhao-hai;LI Wo-ying(Jiangmen Fangyuan New Energy Material Co.,Ltd.,Guangdong Jiangmen 529000,China)
出处 《广州化工》 CAS 2019年第14期128-130,共3页 GuangZhou Chemical Industry
关键词 镍钴锰氢氧化物 硅含量 电感耦合等离子体原子发射光谱仪 nickel cobalt manganese hydroxide content of silicon inductively coupled plasma atomic emission spectrometer
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