摘要
为了研究预处理阶段工艺参数对镀层性能的影响,采用阴极弧离子镀方法在钛合金上制备TiN镀层。用金属离子轰击预溅射基底,对基底的活性和温度进行不同程度的改变。本实验保持温度、真空度、抽气速率及其他电参数固定不变,仅以轰击预溅射的时长为唯一变量,分别轰击3、6、9、12、15和18min,从而完成对镀层成膜情况的对比研究。利用扫描电子显微镜来观察镀层断面结构,利用维氏硬度计测量显微硬度,采用划痕法来判定镀层与基底的结合强度,通过摩擦磨损实验来测试薄膜的耐磨性。测试结果表明,随着轰击时间的延长,基片活性增加,有利于形核和薄膜生长,沉积速率、膜基结合强度和耐磨性均呈规律性增加。当轰击时间为15min时,膜基之间粘附性达到最佳,膜基结合力大于65N,耐磨性能较好,成膜情况最优。过度延长轰击时间后,基片沉积温度过高,内应力增大,结合强度和耐磨性能反而下降。实验证明,通过调整轰击时间可以改善镀层性能,最终达到沉积速率、硬度、结合强度和耐磨性能的优化配置。
The TiN coatings were deposited by cathodic arc ion plating,on the substrates of Ti-alloy and n-type Si(100) wafer activated by pre-sputtering of Ar-ions.The influence of the sputtering time on the microstructures,triboligical behavior and interfacial adhesion was investigated with scanning electron microscope and conventional mechanical probes.The results show that depending on Ar-ion current,the pre-sputtering time had a major impact.For example,as the sputtering time increased to 15 mim,the increase of reaction-activity of substrate surface significantly improved the nucleation density,deposition rate,hardness,friction coefficient,wear-resistance,interfacial adhesion and compactness of the TiN coatings.The interfacial adhesion of the TiN coating and the substrate pre-sputtered for 15 min was estimated to be over 65 N.However,over-sputtering resulted in deterioration.Possible mechanism responsible for the improvements was tentatively discussed in a thought provoking way.
作者
钟利
陈美艳
沈丽如
Zhong Li;Chen Meiyan;Shen Liru(Southwestern Institute of Physics, Chengdu 610207 , China)
出处
《真空科学与技术学报》
EI
CAS
CSCD
北大核心
2019年第7期577-582,共6页
Chinese Journal of Vacuum Science and Technology
