摘要
目的研究不同沉积压力对磁控溅射WS2薄膜微观结构、力学性能和摩擦学性能的影响。方法采用射频磁控溅射法制备WS2薄膜。利用扫描电镜(SEM)和X射线衍射仪(XRD)对薄膜微观形貌、成分和晶相结构进行表征。用纳米压痕仪、摩擦磨损试验机和白光干涉三维形貌仪测试薄膜的力学性能和摩擦磨损性能。结果随着沉积压力增大,WS2薄膜疏松多孔结构明显降低,粗大柱状晶显著细化,薄膜致密度得到有效改善。沉积压力大于0.8Pa时,WS2薄膜表现出明显的(101)晶面择优取向。WS2薄膜硬度变化与薄膜中S/W原子比变化趋势相反,弹性模量逐渐减小。沉积压力0.4 Pa时,由于WS2薄膜大部分易滑移(002)晶面平行于基体表面,摩擦系数最低,为0.092,但其耐磨性能最差。沉积压为1.6 Pa时,WS2薄膜的磨损率最低,为2.34×10^-7 mm^3/(N·m),表现出良好的耐磨性能。结论改变沉积压力可以显著提高WS2薄膜致密度,改善薄膜的力学性能,提升WS2薄膜的摩擦磨损性能。
The work aims to study the effects of different deposition pressures on the microstructure,mechanical properties and tribological properties of WS2 films by magnetron sputtering.WS2 films were deposited by RF magnetron sputtering technology.The micromorphology,composition and crystal orientation of the films were characterized by using scanning electron microscope(SEM)and X-ray diffraction(XRD).The mechanical properties and friction and wear properties of the films were tested respectively by using nano indentation,friction and wear tester and white light interferometer 3D profilometer.With the increase of deposition pressure,the loose and porous structure of WS2 films were decreased obviously,the coarse columnar crystal was refined obviously, and the density of WS2 films was improved effectively. When the deposition pressurewas more than 0.8 Pa, WS2 films presented the preferential orientation of (101) basal plane. The hardness change of WS2 filmswas opposite to that of S/W atomic ratio in the films, and the elastic modulus was decreased gradually. When the depositionpressure was 0.4 Pa, most of the slip surface of WS2 films (002) was parallel to the substrate surface, the friction coefficient ofWS2 film was the smallest, 0.092, but the wear resistance of WS2 film was the worst. When the deposition pressure was 1.6 Pa,the wear rate of WS2 film was the smallest, 2.34×10?7 mm3/(N·m), and the wear-resisting property of WS2 film was better.Changing the deposition pressure can significantly improve the density, mechanical properties and friction and wear propertiesof WS2 films.
作者
贺江涛
蔡海潮
薛玉君
HE Jiang-tao;CAI Hai-chao;XUE Yu-jun(School of Electrical and Mechanical Engineering,Henan University of Science and Technology,Luoyang 471003,China;Henan Key Laboratory for Machinery Design and Transmission System,Henan University of Science and Technology,Luoyang 471003,China)
出处
《表面技术》
EI
CAS
CSCD
北大核心
2020年第4期180-187,共8页
Surface Technology
基金
国家国防基础科研计划项目(JCKY2018419C101)
河南省科技攻关项目(182102210299)。
关键词
沉积压力
磁控溅射
WS2薄膜
摩擦系数
磨损率
deposition pressure
magnetron sputtering
WS2 film
friction coefficient
wear rate
