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机器人恒压球形公自转磨头抛光技术研究 被引量:1

Robot Polishing Technology of Spherical Grinding Head with Revolution and Rotation Motion Based on Constant Pressure Control
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摘要 采用工业机器人进行大口径光学元件的研抛过程中,机器人自身定位误差会导致研抛压力产生波动,进而影响去除函数稳定性,为此提出了一种机器人恒压球形公自转磨头抛光方法,并对其结构、工作原理、机器人定位特性以及研抛压力输出特性开展了研究。首先,基于Preston理论构建了材料去除模型,对去除函数形状进行了分析,对所设计抛光磨头的机械结构与工作原理进行了介绍。然后,对机器人定位误差以及磨头输出力响应性与稳定性进行了测量,验证了所提方法能够较好地适应机器人研抛压力波动而做出的力响应控制。最后,进行了定点抛光以及粗、精磨抛加工实验。实验结果表明:利用所提方法去除函数的稳定性强,通过10个周期的粗、精抛加工,面形收敛率分别为90.95%、72.61%,可获得较高的加工精度与面形质量。 Aiming at the problems that the fluctuation of polishing pressures was caused by positioning errors of industrial robot and thus the stability of removal function was affected during the polishing processes of large-aperture optical elements,a kind of robot polishing method of spherical grinding head with revolution and rotation motion based on constant pressure control was proposed.The structure,working principle,positioning characteristics of the robot and output characteristics of polishing pressure were studied.Firstly,the material removal model was constructed based on Preston theory,the shapes of the removal function were analyzed,and the mechanics mechanism and working principle of the designed polishing grinding head were introduced.Then,the positioning errors of the robot as well as the response and stability of the output forces of the grinding head were measured,which proved that the proposed method might adapt to the pressure fluctuation of robot polishing and make the corresponding force response control.Finally,the fixed point polishing and rough and precision polishing experiments were carried out.The experimental results show that the removal function is stable by using the proposed method.After 10 cycles of rough and precision polishing,the convergence rates of the surface are as 90.95%and 72.61%respectively,and may obtain high machining precision and quality.
作者 黄智 吴湘 刘海涛 万勇建 郑晓 陈祥 HUANG Zhi;WU Xiang;LIU Haitao;WAN Yongjian;ZHENG Xiao;CHEN Xiang(School of Mechanical and Electrical Engineering,University of Electronic Science and Technology of China,Chengdu,611731;Institute of Optics and Electronic,Chinese Academy of Sciences,Chengdu,610209)
出处 《中国机械工程》 EI CAS CSCD 北大核心 2020年第5期519-526,共8页 China Mechanical Engineering
基金 国家重点研发计划资助项目(2016YFB0500400)。
关键词 光学抛光 去除函数 抛光工具 抛光压力 optical polishing removal function polishing tool polishing pressure
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