摘要
本文介绍了应用于石墨烯制备的CVD反应炉的工艺原理及技术特点,并以一台已经研制成功的CVD反应炉为例,详细阐述了该设备的相关设计思路及特点。该设备采用先进的控温技术控制加热器的快速升温,通过闭环控制实现了工艺过程中腔室压力的自动控制,具有控制精度高、响应快、一致性好等优点。
This paper introduces the process principle and technical characteristics of CVD reaction furnace for graphene preparation. Taking one of the as-developed CVD reaction furnace as an example,the design ideas and characteristics of the equipment are elaborated in detail. The equipment adopts advanced temperature control technology to control the heater ′ s rapid heating,and realizes the automatic control of chamber pressure in the process by closed-loop control. It has the advantages of high control accuracy,fast response and good consistency.
作者
高超
张吉峰
唐榕
GAO Chao;ZHANG Ji-feng;TANG Rong(Beijing Vacuum Electronics Research Institute,Beijing 100016,China)
出处
《真空》
CAS
2020年第3期30-33,共4页
Vacuum
关键词
石墨烯
CVD
温度控制
反应室压力调节
闭环控制
graphene
CVD
temperature control
reactor pressure regulation
closed-loop control
