摘要
为了改善氧化铈抛光液的性能,在不破坏钕玻璃表面质量的前提下提高钕玻璃的抛光效率,选择在氧化铈抛光液中加入阴离子表面活性剂雷米邦A,并研究了改性后的抛光液对氧化铈抛光液中粒子粒径、钕玻璃的材料去除率和抛光后钕玻璃表面质量的影响,分析了加入不同质量分数雷米邦A的抛光液在不同pH值下对钕玻璃抛光速率和抛光质量的影响。结果表明:雷米邦A能够抑制抛光液中纳米粒子的团聚,降低氧化铈的中位粒径,提高抛光效率。当二氧化铈质量分数为3%、pH为6.5、雷米邦A质量分数为0.30%时,材料去除率达到最大值169 nm/min;当二氧化铈质量分数为3%、pH为7、雷米邦A质量分数为0.20%时,钕玻璃的表面粗糙度达到最小值0.9 nm。
To enhance the performance of cerium oxide polishing slurry and improve the polishing efficiency of Nd-glass without destroying the surface quality of Nd-glass, anionic surfactant Lamepon A was chosen to be added to the cerium oxide polishing slurry. In this work, the effects of the modified polishing slurry on the particle size of the cerium oxide polishing slurry, material removal rate of Nd-glass, and surface quality of Nd-glass after polishing were studied. The effect of pH of polishing slurry with different mass fraction of Lamepon A on the polishing rate and quality of Nd-glass were also studied. The results show that Lamepon A can inhibit the agglomeration of nanoparticles in the polishing slurry, reduce the median diameter of cerium oxide, and improve the polishing efficiency. When the mass fraction of the cerium oxide is 3%, the pH is 6.5, and mass fraction of Lamepon A is 0.30%, the material removal rate attains a maximum value of 169 nm/min;when the mass fraction of the cerium oxide is 3%, the pH is 7, the mass fraction of Lamepon A is 0.20%, the surface roughness reaches a minimum of 0.9 nm.
作者
刘伯勋
焦翔
谭小红
朱健强
Liu Boxun;Jiao Xiang;Tan Xiaohong;Zhu Jianqiang(School of Physical Science and Technology,Shanghai Tech University,Shanghai 201210,China;National Laboratory on High Power Laser and Physics,Shanghai Institute of Optics and Fine Mechanics,Chinese Academy of Sciences,Shanghai 201800,China;National Laboratory on High Power Laser and Physics,China Academy of Engineering Physics,Chinese Academy of Sciences,Shanghai 201800,China)
出处
《中国激光》
EI
CAS
CSCD
北大核心
2020年第10期113-117,共5页
Chinese Journal of Lasers
基金
国家自然科学基金(61827816,11875308,61675215)
上海市“科技创新行动计划”(19142202600)。
关键词
材料
化学机械抛光
磷酸盐激光钕玻璃
阴离子表面活性剂
材料去除率
表面粗糙度
materials
chemico-mechanical polishing
Nd-doped phosphate laser glass
anionic surfactant
material removal rate
surface roughness
