摘要
针对半球谐振子表面金属薄膜残余应力分布情况,对半球谐振子Q值的影响特性进行了仿真。根据仿真结果,采用多自由度磁控溅射及基底均匀加热的方法进行了薄膜沉积工艺试验。控制多自由度旋转机构自转、公转、摆动参数分别为7r/min、12r/min和15 (°)/s,将基体均匀加热至120℃,在时长为26min的溅射之后得到了厚度为100nm左右的膜层。在真空状态下对半球谐振子镀膜后的品质因数进行了检测,结果表明可有效控制镀膜后的Q值衰减不超过30%。
According to the distribution of the metal film residual stress on the surface of hemispherical resonator,the characteristics of Q factor of hemispherical resonator are simulated.The method of Multi-DOF magnetron sputtering coating and uniformly heating of substrate is performed to produce film deposition.The film of approximately 100 nm is obtained through uniformly heating the substrate to 120℃,sputtering about 26min,and setting the parameters of autobiography,revolution and swing of multi-DOF rotating mechanism 7 R/min,12 R/min and 15°/s respectively.The Q factor of hemispherical resonator is tested in vacuum after coating.The experimental results show that the process can effectively control Q factor decay within 30%.
作者
楚建宁
朱蓓蓓
秦琳
刘青
兰洁
陈肖
许剑锋
CHU Jianning;ZHU Beibei;QIN Lin;LIU Qing;LAN Jie;CHEN Xiao;XU Jianfeng(School of Mechanical Science&Engineering,Huazhong University of Science and Technology,Wuhan 430074;Shanghai Aerospace Control Technology Institute,Shanghai 201109)
出处
《飞控与探测》
2021年第1期52-59,共8页
Flight Control & Detection
基金
装发部十三五共用技术预研项目(2017-2020)。
关键词
半球谐振陀螺
多自由度转动机构
谐振子镀膜
Q值仿真
残余应力
hemispherical resonator gyroscopes
multi-DOF rotating mechanism
coating of HRG
simulation of Q factor
residual stress
