摘要
TiN硬质膜是很多现有的多组元氮化物硬质膜的基础。N/Ti原子比对TiN硬质膜具有重要影响。结合TiN硬质膜的制备工艺方法,分析了膜层中N含量变化的影响因素及控制方法,详细讨论了N/Ti原子比对TiN膜相组成、硬度、耐摩擦磨损性能、光电性能的影响关系。
TiN hard films are the basis of many existing multi-component nitride hard films.The N/Ti atomic ratio has important influences on TiN hard films.Based on the preparation process methods of TiN hard films,the influencing factors and control ways of the change of N content in the films were discussed.Besides,the influences of N/Ti atomic ratio on the phase composition,hardness,wear and abrasion resistance and the photoelectric properties of TiN films were analyzed in detail.
作者
彭立静
张钧
徐晨宁
王晓阳
王美涵
PENG Li-jing;ZHANG Jun;XU Chen-ning;WANG Xiao-yang;WANG Mei-han(College of Mechanical Engineering,Shenyang University,Key Laboratory of Research and Application of Multiple Hard Films,Shenyang 110044,China)
出处
《材料保护》
CAS
CSCD
2021年第4期127-132,共6页
Materials Protection
基金
辽宁省高等学校创新人才支持计划项目(LR2019044)资助。
