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Dry-etched ultrahigh-Q silica microdisk resonators on a silicon chip 被引量:2

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摘要 We demonstrate the fabrication of ultrahigh quality(Q) factor silica microdisk resonators on a silicon chip by inductively coupled plasma(ICP) etching. We achieve a dry-etched optical microresonator with an intrinsic Q factor as high as 1.94×10^(8) from a 1-mm-diameter silica microdisk with a thickness of 4 μm. Our work provides a chip-based microresonator platform operating in the ultrahigh-Q region that will be useful in nonlinear photonics such as Brillouin lasers and Kerr microcombs.
出处 《Photonics Research》 SCIE EI CAS CSCD 2021年第5期722-725,共4页 光子学研究(英文版)
基金 National Key Research and Development Program of China(2016YFA0302500,2017YFA0303703) National Natural Science Foundation of China(NFSC)(61922040,11621091) Fundamental Research Funds for the Central Universities(021314380149)。
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