摘要
为了分析逆向调制器的反射光场和反射光强的变化规律,利用532 nm激光照射逆向调制器阵列,测试得到了离焦量、入射角变化时的逆向调制器的反射光场和反射光强,得到了阵列调制器反射光强与单个逆向调制器反射光强关系。测试结果表明,一定范围的正离焦使反射光束发散角变小,反射光能量聚焦度好,负离焦相反。入射角使反射光场发生畸变,反射光强与入射角成反比。离焦量为0或负离焦时,阵列调制器的反射光强是单个调制器反射光强的线性叠加。
In order to analyze the variation of the reflected light field and the reflected light intensity of the retro-reflected modulator,the array retro-reflected modulator is illuminated by a 532 nm laser.The reflected light field and reflected light intensity value are obtained when the amount of defocus and the incident angle are changed.The reflected light intensity relationship between the array modulator and a single modulator is obtained.The test results show that the positive defocus in a certain range makes the divergence angle of the reflected beam smaller,the energy of the reflected light is better,and the negative defocus is opposite.The incident angle is the distortion of the reflected light field,and the reflected light intensity is inversely proportional to the incident angle.When no-defocusing or negative defocusing,the reflected light intensity of the array modulator is a linear superposition of the reflected light intensity of single modulator.
作者
张来线
任建迎
孙华燕
刘瑞丰
赵延仲
ZHANG Lai-xian;REN Jian-ying;SUN Hua-yan;LIU Rui-feng;ZHAO Yan-zhong(Department of Electronic and Optical Engineering,Space Engineering University,PLA Strategic Support Force,Beijing 101416,China;Graduate School,Space Engineering University,PLA Strategic Support Force,Beijing 101416,China)
出处
《激光与红外》
CAS
CSCD
北大核心
2021年第6期747-751,共5页
Laser & Infrared
关键词
逆向调制
线性阵列
光场分布
光强分布
离焦量
入射角
retro-reflected modulation
linear array
optical field distribution
optical intensity distribution
defocus amount
angle of incidence
