摘要
介绍了一种具有广泛应用前景的新型等离子体源—螺旋波等离子体源,其特点是结构简单,可以产生高密度的等离子体。论文首先简述了螺旋波等离子体产生基本原理,并对螺旋波等离子体源的结构、加热机制以及天线形式与其能量耦合方式进行了介绍。然后,概述了螺旋波等离子体源的特性和诊断方式,主要介绍迟滞能量分析仪(RFEA)对螺旋波等离子体中的离子能量分布(IED)诊断,并对影响IED的因素进行分析。随后介绍了螺旋波等离子体源在刻蚀、薄膜沉积以及电推进三个领域的应用进展。最后指出螺旋波等离子体源的未来发展以及存在的一些问题。
This article reviews a new type of plasma,helicon plasma,which is characterized by its simple structure and generation of high-density plasma.First,the basic principle of helicon plasma is described briefly,including the helicon plasma source structure,heating mechanism,antenna form and energy coupling mode.Then,the characteristics and diagnosis methods of the helicon plasma are introduced.Among them,the ion energy distribution(IED)by the retarding field energy analyzer(RFEA)is emphasized,and the factors affecting IED value are analyzed.Subsequently,the application progresses of the helicon plasma in the three fields of etching,thin film deposition and electric propulsion are mainly introduced.Finally,the future perspectives of helicon plasma source and some challenges are pointed out.
作者
姜开银
杨丽珍
刘忠伟
张海宝
陈强
JIANG Kai-yin;YANG Li-zhen;LIU Zhong-wei;ZHANG Hai-bao;CHEN Qiang(Lab of Plasma Physics&Materials,Beijing Institute of Graphic Communication,Beijing 102600,China)
出处
《真空》
CAS
2021年第4期67-76,共10页
Vacuum
基金
国家自然科学基金(批准号11875090、12075032、11775028)
北京市自然科学基金(批准号1192008,KZ202010015022)
北京印刷学院科研项目(Ea201901,Ee202001)。
关键词
螺旋波
结构
原理
离子能量分布
应用进展
helicon wave
structure
principle
ion energy distribution
application progress
