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Analysis of optical emission spectroscopy data during silicon etching in SF_(6)/O_(2)/Ar plasma

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摘要 Silicon etching is an essential process in various applications,and a major challenge for etching process is anisotropic high aspect ratio etching characteristics.The etch profile is determined by the plasma parameters and process parameters.In this study,the plasma state with each process parameters were analyzed through the optical emission spectroscopy(OES)plasma diagnostic sensor by both chemical and physical approaches.Electron temperature and electron density were additionally acquired using the corona model with OES data that provides chemical species information,and the etch profile was evaluated through scanning electron microscope measurement data.The results include changes in profile with gas ratio,bias power,and pressure.We figure out that factors like ion energy and ion angular distribution as well as chemical reaction affect the anisotropic profile.
出处 《Plasma Science and Technology》 SCIE EI CAS CSCD 2021年第12期117-127,共11页 等离子体科学和技术(英文版)
基金 supported by the Koran Ministry of Trade,Industry&Energy(MOTIE:GID:20006499)via KSRC(Korea Semiconductor Research Consortium)support program。
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