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振动辅助纳米压印制备大面积光栅结构 被引量:2

Preparation of large-area grating structure by vibration-assisted nanoimprint
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摘要 为了解决纳米压印过程中填充率低下,压印图案易发生形变等问题,提出了一种新型振动辅助纳米压印方法。在压印过程中对压印胶施加横向的振动,增大了压印力,从而提高了填充率。运用时域有限差分法(finite difference time domain,FDTD),在波长300 nm~1000 nm范围内,数值模拟了不同光栅结构,得到了光栅结构参数变化对其吸收率的影响规律。在振动辅助装置上进行振动辅助纳米压印实验,实验结果表明:与传统纳米压印技术相比,压印胶的填充率提高了30%,并改善了压印后微结构的表面形貌,减少了缺陷。 In order to solve the problems of low filling rate and easy deformation of imprinting patterns in the process of nanoimprint,a new vibration-assisted nanoimprint method was proposed.In the process of imprinting,the transverse vibration was applied to the imprinting adhesive,which increased the imprinting force and improved the filling rate.Using finite difference time domain(FDTD)method,different grating structures were numerically simulated in the wavelength range of 300 nm~1000 nm,and the influence rule of grating structure parameters on its absorptivity was obtained.Finally,the vibration-assisted nanoimprint experiment was carried out on the vibration-assisted device.The experimental results show that compared with the traditional nanoimprint technology,the filling rate of imprinting adhesive is increased by 30%,the surface morphology of microstructure after imprinting is improved and the defects are reduced.
作者 孙宝玉 许济琛 谷岩 林洁琼 李洁 SUN Baoyu;XU Jichen;GU Yan;LIN Jieqiong;LI Jie(College of Mechanical Engineering,Changchun University of Technology,Changchun 130012,China)
出处 《应用光学》 CAS CSCD 北大核心 2022年第1期124-130,共7页 Journal of Applied Optics
基金 中央引导地方科技发展资金吉林省基础研究专项(202002034JC) 吉林省教育厅科学技术研究项目(JJKH20210722KJ)。
关键词 振动辅助 纳米压印 光栅结构 填充率 vibration-assisted nanoimprint grating structure filling rate
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  • 1SAXENA K, JAIN V K, MEHTA D S. A review on the light extraction techniques in organic electroluminescent devices [J]. Optical Materials, 20(19, 32 (1) : 221-233.
  • 2CHOU S Y, KRAUSS P R, RENSTROM P J. Imprint of sub-25 nm vias and trenches in polymers [J]. Appl Phys Lett, 1995, 67 (21): 3114-3116. C.
  • 3HOU S Y, KRAUSS P R, RENSTROM P J. Imprint litho- graphy with 25manometer resolution [J]. Science, 1996, 272 (5258): 85-87.
  • 4CHOU S Y, KRAUSS P R, RENSTROM P J. Nanoimprint li- thography [J]. J Vac Sci Technol: B, 1996, 14 (6) : 4129- 4133.
  • 5COLBURN M, GROT A, AMISTOSO M, et al. Step and flash imprint lithography for sub-100 nm patterning [J]. Pro- ceedings of SHE, 2000, 3997:453 - 457.
  • 6CHOI B J, RUCHHOEFT P, SREENIVASAN S V, et al. Layer-to-layer alignment for step and flash imprint lithography[J]. Proceedings of SHE, 2001, 4343: 436-442.
  • 7SCHULZ H, LYEBYEDYEV D, SCHEER H C, et al. Mas- ter replication into thermosetting polymers for nanoimprinting [J]. J Vac Sci Technol: B, 2000, 18 (6) : 3582 - 3585.
  • 8CHOU S Y. Release surfaces, particularly for use in nano- imprint lithography: US, 6309580 131 [P]. 2001- 10- 30.
  • 9Schweikart A,Pazos-Pérez N,Alvarez-Puebla R A,et al.Soft Matter,2011,7(9):4093.
  • 10Yu C,O'Brien K,Zhang Y H,et al.Appl.Phys.Lett.,2010,96(4):041111.

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