摘要
选用纳米球刻蚀技术在蓝宝石(Al_(2)0_(3))基底上制备350 nm聚苯乙烯(PS)微球密排掩模版,然后采用反应射频磁控溅射方法分别在PS/Al_(2)0_(3)和Al_(2)0_(3)基底上沉积氧化锌(ZnO)薄膜,去除掩模版的PS微球后,对经退火处理的两种样品进行X射线衍射分析、扫描电子显微镜观察和荧光光谱测试。结果表明,在PS/Al_(2)O_(3)上生长的ZnO薄膜(样品1)的晶粒呈明显的蠕虫状,而直接在Al_(2)O_(3)基底上生长的ZnO薄膜(样品2)表面晶粒为不完全六棱台形状。样品2的结晶性能优于样品1,但是在362 nm附近样品1的近带边缘荧光发射峰强度比样品2的发射峰强43倍。
350 nm polystyrene microspheres(PSs)are prepared on sapphire substrates as masks by nanosphere lithography technique,and then ZnO thin films are grown on PS/Al_(2)O_(3)and Al_(2)O_(3)substrates by reactive radio frequency magnetron sputtering method,respectively.X-ray diffraction analysis,scanning electron microscope observation,and photoluminescence(PL)test are used to measure two kinds of samples after annealing;the PS mask is removed from the Al_(2)O_(3) substrate. The results show that the grains of the ZnO thin film grown on the PS/Al_(2)O_(3) (sample 1) are obviously worm-like;the grains of the ZnO thin film directly grown on the Al_(2)O_(3) substrate(sample 2) show incomplete hexagonal prism shape. Although the crystallization of sample 2 is better than that of sample 1, the intensity of near band edge photoluminescence peak of sample 1 around 362 nm is 43 times stronger than that of sample 2.
作者
刘姿彤
尤聂薇
朱亚彬
张致诚
刘歌
陈云琳
Liu Zitong;You Niewei;Zhu Yabin;Zhang Zhicheng;Liu Ge;Chen Yunlin(Department of Physics,School of Science,Beijing Jiaotong University,Beijing 100044,China;Institute of Applied Micro-Nano Materials,School of Science,Beijing Jiaotong University,Beijing 100044,China)
出处
《光学学报》
EI
CAS
CSCD
北大核心
2022年第5期265-269,共5页
Acta Optica Sinica
基金
国家大学生创新训练计划(210170067)。
关键词
薄膜
紫外波段
光致发光
氧化锌薄膜
反应射频磁控溅射
纳米球刻蚀技术
thin films
ultraviolet band
photoluminescence
ZnO thin film
reactive radio frequency magnetron sputtering
nanosphere lithography technique
