摘要
Direct laser writing(DLW)enables arbitrary three-dimensional nanofabrication.However,the diffraction limit poses a major obstacle for realizing nanometer-scale features.Furthermore,it is challenging to improve the fabrication efficiency using the currently prevalent single-focal-spot systems,which cannot perform high-throughput lithography.To overcome these challenges,a parallel peripheral-photoinhibition lithography system with a sub-40-nm two-dimensional feature size and a sub-20-nm suspended line width was developed in our study,based on two-photon polymerization DLW.The lithography efficiency of the developed system is twice that of conventional systems for both uniform and complex structures.The proposed system facilitates the realization of portable DLW with a higher resolution and throughput.
基金
the National Key Research and Development Program of China(Grant No.2021YFF0502700)
the National Natural Science Foundation of China(Grant Nos.62105298,52105565,and 22105180)
China Postdoctoral Science Foundation(Grant Nos.2020M671823 and 2020M681956)
the Natural Science Foundation of Zhejiang Province,China(Grant Nos.LD21F050002,LQ22F050017,and LQ22F050015)
the Major Scientific Project of Zhejiang Lab,China(Grant No.2020MC0AE01).
