摘要
随着电子信息产业的快速发展,市场对靶材的质量提出了越来越高的要求。热等静压技术作为一种材料成形及特殊热处理方法,经过多年发展,已成为制备高品质靶材的重要手段。简要介绍了热等静压技术的发展、设备工作原理以及难熔金属靶材的性能要求。重点介绍了热等静压技术在高品质难熔金属Mo、W、Cr及其合金靶材制备中的应用,以及热等静压工艺对其微观组织及溅射性能的影响。
With the rapid development of electronic information industry,the market puts forward higher requirements for the quality of targets.As a material forming and special heat treatment method,hot isostatic pressing technology has become an important method to prepare high-quality targets after years of development.The development of hot isostatic pressing technology,the working principle of equipment and the performance requirements of refractory metal targets are briefly introduced.The application of hot isostatic pressing technology in the preparation of high-quality refractory metal Mo,W,Cr and their alloy targets,and the influence of hot isostatic pressing technology on its microstructure and sputtering properties are highlighted.
作者
吕周晋
车立达
吴战芳
李好峰
张鹏杰
何静
李向阳
LÜZhoujin;CHE Lida;WU Zhanfang;LI Haofeng;ZHANG Pengjie;HE Jing;LI Xiangyang(CISRI HIPEX Technology Co.,Ltd.,Beijing 100081,China;China Iron&Steel Research Institute Group,Beijing 100081,China)
出处
《粉末冶金工业》
CAS
北大核心
2022年第6期100-107,120,共9页
Powder Metallurgy Industry
关键词
热等静压
高品质靶材
纯度
难熔金属
致密度
hot isostatic pressing
high-quality target
purity
refractory metal
densification
