期刊文献+

高级次通带滤光膜设计与制备技术

Design and Preparation Technology of Advanced Pass Band Filter Films
下载PDF
导出
摘要 滤光膜主要是用来选取所需要辐射波段的光学零件,可以应用在可见、微光、近红外、短波红外、中远红外等光电系统中,起到波段分离、干扰抑制、色差补偿等关键作用。因此,在白光成像、微光夜视、激光测距、激光制导、红外探测等具备多项功能的军用光电装备中得到了广泛的应用。从对称膜系结构的矩阵计算公式出发,阐述了高级次截止带的产生与消除条件,通过膜系结构中匹配膜料系数,设计了2种高级次截止带消除的滤光膜系结构,比较2种膜系的工艺容差,选择最优滤光膜系结构进行了真空镀膜工艺制备,指出了制备过程中被抑制的高级次截止带会再次出现是由于匹配系数失配及修正匹配系数对策。同时,利用APS离子源辅助镀膜技术,提升了薄膜的成膜质量,达到了所制备膜系在胶合棱镜45°倾斜测试下450~650 nm, Tave≥90%,1 570 nm±10 nm, Rave≥95%的滤光要求,膜层质量满足JB/T 8226.8—1999检测标准。 The filter film was mainly used to select the optical parts of the required spectral band, which could be used in the visible, low light level, near infrared, short wave infrared, mid infrared, far infrared and other optoelectronic systems, and played a key role in band separation, interference suppression, color difference compensation and so on. Therefore, it has been widely used in military optoelectronic equipment with multiple function, such as white light imaging, low light level night vision, laser ranging, laser guidance, infrared detection, etc. Starting from the matrix calculation formula of symmetrical film system structure, we expounded the generation and elimination conditions of high-order cut-off band. By matching the film material coefficient in the film system structure, two kinds of filter film systems with high-order cut-off band elimination were designed, the process tolerances of the two film systems were compared, and the optimal filter film system structure was selected for vacuum coating process preparation. It was point out that the reason for the recurrence of the suppressed high-order cut-off band in the preparation process was the mismatch of the matching coefficient and the countermeasure of modifying the matching coefficient. At the same time, APS ion source assisted coating technology was used to improve the film quality, and the prepared film system reached 450-650 nm, Tave≥90%, 1 570 nm±10 nm, Rave≥95%, under 45 degree tilt test of the glued prism, and the film quality met the JB/T 8226.8—1999 test standard.
作者 张金豹 史成浡 耿浩 南勇 崔世俊 ZHANG Jinbao;SHI Chengbo;GENG Hao;NAN Yong;CUI Shijun(Henan PingYuan Optics&Electronics Co.,Ltd.,Jiaozuo 454001,China)
出处 《新技术新工艺》 2023年第1期24-30,共7页 New Technology & New Process
关键词 光电系统 光学薄膜 滤光膜 高级次 通带 截止带 optic-electro system optical films filter films advanced pass band cut-off band
  • 相关文献

参考文献7

二级参考文献44

共引文献36

相关作者

内容加载中请稍等...

相关机构

内容加载中请稍等...

相关主题

内容加载中请稍等...

浏览历史

内容加载中请稍等...
;
使用帮助 返回顶部