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感光干膜相关技术研究进展 被引量:4

Research progress of photosensitive dry film related technologies
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摘要 感光干膜又称光致抗蚀干膜,是一种固态负性光刻胶,作为生产印制电路板(printed circuit board,PCB)的重要原材料之一,市场规模巨大。随着电子产品精密和微型化需求的日益增长,传统的PCB生产技术,图形转移技术无法满足生产需求;激光直接成像(laser direct imaging,LDI)技术具有高精度特点,被广泛应用于感光干膜生产中。从感光干膜的性能和特征、感光干膜行业的技术壁垒及感光感膜的发展现状和应用领域等方面综述了感光干膜相关技术的研究进展,为相关行业工作者提供理论参考。 Photosensitive dry film,also known as dry film photoresist,is a solid negative photoresist,which serves as an important raw material for the production of printed circuit board(PCB),and has huge market potential.With the increasing demand for precision and miniaturization of electronic products,the traditional pattern transfer technology for the production of PCB cannot meet the production demand;Laser direct imaging(LDI)finds its wide application in the production of photosensitive dry film due to its high precision.The research progress of photosensitive dry film related technologies was reviewed in terms of its performance,characteristics,the technical barriers,development status and application field,etc.,so as to provide theoretical reference for workers in related industries.
作者 江叔福 吴雅 郑伟 JIANG Shufu;WU Ya;ZHENG Wei(Zhejiang Mingtian Electronic New Materials Co.,Ltd.,Huzhou 313000,Zhejiang,China)
出处 《应用技术学报》 2023年第1期38-42,共5页 Journal of Technology
关键词 感光干膜 光刻胶 激光直接成像技术 负性光刻胶 photosensitive dry film photoresist laser direct imaging technology negative photoresist
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