摘要
电子级超纯水在半导体制造中用量很大,目前超纯水生产以“预处理+反渗透(RO)+电除盐(EDI)”为主单元的长流程工艺为主。在此基础上,提出了一种以中空纤维纳滤(HFNF)和平板真空多效膜蒸馏(VMD)替代EDI之前所有工艺段的短流程生产工艺,把超纯水生产工艺从原长流程的12个以上工艺段减少至6个以下。研究结果表明,以HFNF+VMD作预处理的产水电导率低于4μS/cm,完全满足EDI的进水要求;在出水水质不变的情况下,短流程生产工艺减少了工艺段,超纯水产水量提高了44.6%,进而可以降低设备投资,而且使维护变得简单且经济;更重要的是短流程生产工艺故障风险位点减少,超纯水工艺和水质更加稳定。
Electronic-grade ultrapure water(UPW)is used extensively in semiconductor manufacturing.At present,the long process including main units of“pretreatment+reverse osmosis(RO)+electro-deionization(EDI)”is pre-dominant in UPW production.On this basis,a compact production process was proposed,which replaced all the pro-cess units before EDI by hollow fiber nanofiltration(HFNF)and plate-frame vacuum multi-effect membrane distilla-tion(VMD),and the UPW production process was reduced from more than 12 units in the original long process to less than 6.The pilot testing results indicated that the conductivity of produced water from HFNF and VMD was less than 4µS/cm,completely meeting feed criteria of EDI unit.With the same effluent quality,the compact production process reduced the number of process units and increased the amount of UPW by 44.6%,thereby reducing equip-ment investment and making maintenance simple and economical.The most important advantage of the compact pro-cess was decreasing malfunction points and making whole process and UPW quality more stable.
作者
高永钢
解保雷
苏成龙
史志伟
FU Fengjiang
GAO Yonggang;XIE Baolei;SU Chenglong;SHI Zhiwei;FU Fengjiang(Beijing CSRE Technology Co.,Ltd.,Beijing 102402,China;3E Memtech Private Limited,Singapore 608501,Singapore)
出处
《工业水处理》
CAS
CSCD
北大核心
2023年第6期164-170,共7页
Industrial Water Treatment
关键词
超纯水生产
半导体制造
中空纤维纳滤
平板真空多效膜蒸馏
短流程工艺
ultrapure water production
semiconductor manufacturing
hollow fiber nanofiltration
plate-frame vacuum multi-effect membrane distillation
compact process
