摘要
针对磁控溅射沉积涂层技术中存在着的靶材利用率低和刻蚀不均匀等问题,基于计算机数值模拟仿真技术,通过对矩形平面磁控溅射靶材的内、外磁铁结构参数的设计,以及导磁片长度和厚度的设置,模拟分析内、外磁铁和导磁片在不同结构参数条件下,靶材的表面磁场及磁感应强度分布。结果表明,在内磁铁高12 mm、直径20 mm,外磁铁高16 mm、直径10 mm的结构参数条件下,靶材表面水平磁场的最大磁感应强度在35 m T左右,且水平磁感应分布均匀。与此同时,在设置长5 mm,厚2 mm的导磁片后能更加明显的改善靶面水平磁场分布,提高靶材的利用率,进而整体改进沉积涂层的综合性能。利用模拟分析可得到靶面水平磁感应强度适中、分布较为合理的靶结构参数,对实际磁控溅射靶的设计具有指导意义。
Aiming at the problems of low target utilization and uneven etching in magnetron sputtering deposition coating technology,based on computer numerical simulation technology,by the design of structural parameters of inner and outer magnets of rectangular planar magnetron sputtering target and the setting of length and thickness of magnetic guide plate,this paper simulates and analyzes the inner and outer magnets and magnetic guide plate under different structural parameters,The surface magnetic field and magnetic induction intensity distribution of the target.The results show that the maximum magnetic induction intensity of the horizontal magnetic field on the target surface is about 35 mt and the horizontal magnetic induction distribution is uniform under the structural parameters of 12 mm high and 20 mm diameter of the inner magnet,16 mm high and 10 mm diameter of the outer magnet.At the same time,after setting a magnetic guide plate with a length of 5 mm and a thickness of 2 mm,it can more significantly improve the horizontal magnetic field distribution on the target surface,improve the utilization rate of the target,and then improve the comprehensive performance of the deposited coating as a whole.The target structure parameters with moderate horizontal magnetic induction intensity and reasonable distribution on the target surface can be obtained by simulation analysis,which has guiding significance for the design of practical magnetron sputtering target.
作者
张而耕
吴昌
陈强
周琼
ZHANG Ergeng;WU Chang;CHEN Qiang;ZHOU Qiong(Shanghai Physical Vapor Deposition(PVD)Superhard Coating and Equipment Engineering Technology Research Center,Shanghai Institute of Technology,Shanghai 201418,China)
出处
《热加工工艺》
北大核心
2023年第12期126-130,共5页
Hot Working Technology
基金
上海应用技术大学中青年科技人才发展基金项目(ZQ2020-24)
上海市自然科学基金项目(20ZR1455700)
国家自然科学基金项目(51971148)。
关键词
磁控溅射靶
Comsol模拟
磁场分布
导磁片
magnetron sputtering target
comsol simulation
magnetic field distribution
magnetic guide plate
