摘要
随着硬质薄膜的快速发展,TiN薄膜已经在诸多领域成功应用。通过采用PVD多功能离子镀膜机在不同工艺参数条件下制备了TiN薄膜,研究不同工艺参数对TiN薄膜表面大颗粒形貌和力学性能的影响。利用扫描电子显微镜对TiN薄膜的表面形貌进行研究,利用球坑仪、划痕仪和显微硬度计对薄膜的力学性能进行分析。研究结果表明,弧电流越大,大颗粒尺寸越大,薄膜厚度及硬度也会显著增加;当沉积温度升高时,TiN表面大颗粒的尺寸与数量显著减小,结合强度出现先增加后减小的趋势;当负偏压增大时,TiN薄膜表面大颗粒出现了先减少后增多的趋势,而薄膜的厚度和硬度也会相应降低。该研究为生产中制备性能优良的TiN薄膜提供了一定的理论依据。
With the rapid development of hard thin films,TiN films have been successfully applied in many fields.TiN thin films were prepared by using a PVD multifunctional ion plating machine under different process parameters,and it was studied that the effects of different process parameters on the morphology and mechanical properties of large particles on the surface of TiN thin films.The surface morphology of TiN thin films was studied by using scanning electron microscopy,and the mechanical properties of the films were analyzed by using the ball-pit tester,the scratch tester,and the microhardness tester.The research results indicated that the larger was the arc current,the larger was the size of large particles,and the thickness and hardness of the film significantly increased.When the deposition temperature increased,the size and quantity of large particles on the TiN surface significantly decreased,and the bonding strength showed a trend of first increasing and then decreasing.When the negative bias voltage increased,there was a trend of first decreasing and then increasing of large particles on the surface of TiN thin films,and the thickness and hardness of the films also decreased accordingly.Therefore,the research provided a certain theoretical basis for the preparation of TiN thin films with excellent performance in production.
作者
于朋
何箐
袁涛
王世兴
董金全
YU Peng;HE Qing;YUAN Tao;WANG Shixing;DONG Jinquan(Beijing Golden Wheel Special Machinery Co.,Ltd.,Beijing 100083,China)
出处
《新技术新工艺》
2023年第10期59-65,共7页
New Technology & New Process
关键词
多弧离子镀
TIN薄膜
表面形貌
弧电流
沉积温度
力学性能
负偏压
multi arc ion plating
TiN thin film
surface morphology
arc current
deposition temperature
mechanical properties
negative bias voltage
