摘要
脉冲激光沉积技术由于具有较高的沉积速率和良好的兼容性,已广泛应用于各种纳米薄膜材料的制备.探究激光等离子体状态与沉积薄膜特性之间的关系,有助于进一步调控与优化脉冲激光技术对薄膜材料的沉积.本文将等离子体状态诊断与沉积薄膜性能相结合,讨论了不同脉冲激光能量下等离子体状态对沉积薄膜性能的影响.结果表明,低烧蚀能量下产生的等离子体更有助于获得质地更好,且与靶材晶相一致的优良薄膜材料.该结果也为探索和调控沉积过程提供参考.
Pulsed laser deposition technology has been widely used in the preparation of various nano-thin film materials because of its high deposition rate and good compatibility.Exploring the relationship between the laser plasma state and the properties of the deposited films is helpful to further regulate and optimize the deposition of thin films by pulsed laser technology.In this work,the plasma state diagnosis is combined with the properties of the deposited films,and the influence of the plasma state on the properties of the deposited films under different pulse laser energies is discussed.The results show that the plasma produced under low ablation energy is more helpful to obtain excellent film materials with good texture and consistent with the target crystal,and the results also provide a certain reference for further exploration and regulation of the deposition process.
作者
王源
高亚青
蔡芸丽
苏茂根
董晨钟
WANG Yuan;GAO Ya-qing;CAI Yun-li;SU Mao-gen;DONG Chen-zhong(Key Laboratory of Atomic and Molecular Physics and Functional Material of Gansu Province,College of Physics and Electronic Engineering,Northwest Normal University,Lanzhou 730070,Gansu,China)
出处
《西北师范大学学报（自然科学版）》
CAS
2024年第2期51-57,共7页
Journal of Northwest Normal University(Natural Science)
基金
国家自然科学基金资助项目(11874051)。
