摘要
为研究调制周期λ和调制比η对Cu/Nb纳米多层膜结构和性能的影响,用磁控溅射沉积Cu/Nb多层膜,λ=30~150 nm,η=1、1.5及2。多层膜微观结构与形貌用X射线衍射仪、扫描电镜及原子力显微镜分析,性能用微力拉伸仪、纳米压痕仪及四探针仪测试。结果表明,Cu/Nb多层膜的结构和性能受控于λ和η。Cu和Nb层分别呈Cu(111)和Nb(110)织构,且均为纳米晶结构。在Cu/Nb界面处,Cu扩散进入Nb层。表面Cu层颗粒尺寸随Cu层增厚而增大。随λ或η减小,Cu/Nb多层膜的屈服强度σ_(0.2)、显微硬度H和电阻率ρ都呈增加趋势。而裂纹萌生临界应变ε_(c)则与1/λ或η呈正相关。
In order to study the influences of modulation periodλand modulation ratioηon structures and properties of Cu/Nb nanoscale multilayers,Cu/Nb multilayers withλ=30~150 nm,η=1,1.5 and 2 were deposited by magnetron sputtering.The microstructure and morphology of multilayers were analyzed by X-ray diffractor,scanning electron microscope,and atomic force microscope.The properties were tested using micro force tension tester,nano-indenter,and four-point probe.The results show that the structures and properties of Cu/Nb multilayers are controlled byλandη.The Cu and Nb layers exhibit Cu(111)and Nb(110)textures,respectively,and both are nanocrystalline structures.At the Cu/Nb interface,Cu diffuses into the Nb layer.The particle size of the uppermost Cu layer increases with the increasing Cu layer thickness.The yield strength σ_(0.2),micro-hardness H and electrical resistivityρof multilayers all show an increasing trend with withλorηdecreases.The critical strain of crack initiationεc is correlated positively with 1/λ or η.
作者
郭中正
闫万珺
张殿喜
杨秀凡
蒋宪邦
周丹彤
Guo Zhongzheng;Yan Wanjun;Zhang Dianxi;Yang Xiufan;Jiang Xianbang;Zhou Dantong(School of Electronics and Information Engineering,Anshun University,Guizhou,561000)
出处
《当代化工研究》
CAS
2024年第6期45-48,共4页
Modern Chemical Research
基金
贵州省教育厅青年科技人才成长项目“非混溶体系铜-钨薄膜结构均质化机理及力学行为研究”(项目编号:黔教合KY字[2019]145号)。
关键词
Cu/Nb纳米多层膜
调制周期
调制比
屈服强度
显微硬度
电阻率
Cu/Nb nanoscale multilayers
modulation period
modulation ratio
yield strength
microhardness
electrical resistivity
