摘要
阐述LPE3061外延设备作为MOS产品外延生产的主力机台,生产过程中存在硅片位置偏离基座坑位的搭边异常现象。通过分析产品参数均匀性、产品外观变异性,探究现有产品探测识别机制的边界条件与适用性。
This paper describes that the LPE3061 epitaxial device,as the main machine for MOS product epitaxial production,has an abnormal phenomenon of silicon wafer position deviating from the base pit position during the production process.By analyzing the uniformity of product parameters and the variability of product appearance,it explores the boundary conditions and applicability of existing product detection and recognition mechanisms.
作者
葛华
李树平
王银海
马梦杰
GE Hua;LI Shuping;WANG Yinhai;MA Mengjie(Nanjing Guosheng Electronics Co.,Ltd.,Jiangsu 211100,China)
出处
《集成电路应用》
2024年第3期64-65,共2页
Application of IC
关键词
集成电路
外延生产
反应圈
搭边识别
integrated circuits
epitaxial production
reaction loops
edge recognition
