摘要
针对传统高盐废水处理采用“膜浓缩+蒸发结晶”方法存在的问题,研究了高盐水零排放系统预处理的软化、除硅、除浊环节,指出相较于传统预处理方法,管式微滤膜具有明显的优势。以内蒙门克庆和榆林小纪汗煤矿项目为例,通过小型试验和中型试验对该工艺系统进行了研究和分析,采用管式微滤膜(TMF)替代澄清池进行固液分离。研究应用结果表明,在进水钙离子浓度为712.5 mg/L,镁离子浓度为110.4 mg/L,总硅(以SiO_(2)计)含量为120 mg/L的条件下,通过加入偏铝酸钠、氯化钙、氯化镁等药剂进行混凝后,利用管式微滤膜进行固液分离,SiO_(2)去除率≥95%,出水满足钙离子浓度≤10 mg/L,镁离子浓度≤10 mg/L,总硅(以SiO_(2)计)含量≤10 mg/L的要求,且满足反渗透进水的浊度≤1 NTU和SDI≤5的要求,运行成本相比原有工艺节省10%~20%。
In response to the problems of traditional high saline wastewater treatment using the"membrane concentration+evaporation crystallization"method,the softening,desilicontion,and turbidity removal steps of high saline water zero discharge system pretreatment were studied,and it was pointed out that compared with traditional pretreatment methods,tubular microfiltration membranes have significant advantages.Taking the Menkeqing Coal Mine and Xiaojihan Coal Mine projects as examples,the process system was studied through small-scale and medium-sized tests,using a tubular microfiltration membrane(TMF)instead of a clarification tank for solid-liquid separation.The application results show that under the conditions of calcium ion concentration of 712.5 mg/L,magnesium ion concentration of 110.4 mg/L,and total silicon(calculated as SiO_(2))content of 120 mg/L in the influent,by adding sodium metaaluminate,calcium chloride,magnesium chloride and other agents for coagulation,the SiO_(2) removal rate is no less than 95%using tubular microfiltration membrane for solid-liquid separation;and the effluent meets the requirements of calcium ion concentration within 10 mg/L,magnesium ion concentration within 10 mg/L,and total silicon(calculated as SiO_(2))content within 10 mg/L,and meets the requirements of turbidity within 1 NTU and SDI within 5 for reverse osmosis influent.The operating cost is saved by 10%~20%compared to the original process.
作者
王小强
WANG Xiaoqiang(China Coal Xi’an Design Engineering Co.,Ltd.,Xi’an 710054,China)
出处
《煤炭工程》
北大核心
2024年第10期231-237,共7页
Coal Engineering
关键词
管式微滤膜
高盐水
除硬
除硅
tubular membranes
high saline water
hardness removal
silicon removal