摘要
通过工艺参数的优化,采用直流反应溅射工艺成功地制备了具有良好的电化学循环稳定性的多晶氧化钨薄膜.Raman散射光谱研究表明:随着锂离子和电子的共同注入,多晶薄膜中的W6+逐渐被还原为W5+.红外反射测试表明:电子注入薄膜后,成为自由载流子,使得氧化钨薄膜表现出一定的金属特性,具有一定的红外反射调制能力.采用该工艺制备的WO3/ITO/Glass结构的发射率可在0.261～0.589的范围内可逆调节.
Polycrystalline tungsten oxide films with good electrochemical stability were prepared by do reactive sputtering methods. The Raman spectra of the films show that W6+ is reduced to W5+ with Li+ and electrons co-intercalation. Intercalated electrons entere extended states of crystalline tungsten oxide and cause infrared reflectance. The emissivity of WO3/ITO/Glass can be reversible modulated between 0.261similar to0.589.
出处
《无机材料学报》
SCIE
EI
CAS
CSCD
北大核心
2002年第6期1263-1268,共6页
Journal of Inorganic Materials
基金
国家自然科学基金(59932040-2)
