摘要
UV -LIGA深度光刻技术是加工微型机电系统的一项重要的微细加工技术。介绍了一种平滑衍射效应的位错强度叠加原理 ,它采用了蝇眼积分透镜去平滑衍射 ,并模拟数值计算了硅片表面的光强分布 。
UV-LIGA deep lithography technology is an important micro fabrication technology of fabricating micro electro mechanical systems. In this paper, the principle of phase dislocation strength super impose of reducing diffraction effects is presented, and the diffraction is reduced making use of Fly's Eye Integral Lens. Numerical simulations of the intensity distribution on the wafer plane have been done. In the end, experimental results are presented.
出处
《微细加工技术》
2002年第3期40-43,共4页
Microfabrication Technology
