摘要
研究了沉积在熔融玻璃基底表面的金薄膜的电输运特性和阻温特性.实验结果表明,在电流小于50mA情况下,金薄膜在真空中的直流I-V特性与传统的RRN模型计算结果相符合;在电流大于50mA情况下,它与传统薄膜系统的直流I-V特性有很大区别.分析表明,熔融玻璃基底表面的非平整性以及不稳定性是影响此类薄膜特征电阻率的主要原因.此外,在一定条件下,金薄膜的阻温系数在温度为43K附近发生正负值转变.
The electrical and RT properties of Au films deposited on melting glass surfaces are studied. Experimental results show that, for low dc current (<50 mA), the dc IV behavior of the Au films in both air and vacuum conditions is consistent with the result of the traditional RRN model; However, when the dc current increases, differences between the results of our samples and the traditional samples are observed. By analysis, that the roughness and instability of melting glass surfaces have an important effect on the resistance behavior of the Au films is concluded. Besides, for the Au films with nanocrystal grains, the dependence between the temperature and resistance is in agreement with that of the metal nanoscale materials. And the coefficient dR/dT of a sample changes from positive value to negative value near the temperature T=43 K.
出处
《浙江大学学报（理学版）》
CAS
CSCD
2003年第4期397-400,共4页
Journal of Zhejiang University（Science Edition）
基金
国家自然科学基金资助项目(19874016)
浙江省青年人才基金资助项目(1997-RC9603).
