摘要
用大功率(kW级)CO_2激光在金属基材上通过化学气相沉积获得α-Si_3N_4膜。膜层多为细小的Si_3N_4颗粒组成,与基材有良好的结合,具有超硬和优良的耐磨抗蚀等性能,厚度在5—30μm范围内可控。
A superhard α-Si_3N_4 film, deposited on metal substrate, was made by laser chemical vapour deposition adopting a kW-level high power CO_2 laser, Most films are of fine grain Si_3N_4. They join the metal substrate in strong bond. The films have super hardness, excellent resistances to wear and corrosion, etc. Their thickness may be controlled within 5—30μm.
出处
《金属学报》
SCIE
EI
CAS
CSCD
北大核心
1992年第8期B351-B355,共5页
Acta Metallurgica Sinica
基金
国家自然科学基金
关键词
Si3N4膜
组织结构
硬度
耐磨
LCVD
laser chemical vapour deposition, Si_3N_4 film, microstructure, hardness, wear resistance, corrosion resistance
