摘要
用光激发荧光谱术分析测量磁控溅射Co—Cr-Al(Y)纳米涂层经1000,1100和1200℃氧化后Al2O3膜中的残余应力,获得如下结果: (1)残余应力随氧化温度升高而增大; (2)暂态氧化出现的区域应力值明显低于无暂态氧化的区域; (3)两种涂层1000℃下形成的氧化膜中的残余应力相差不大,但在1100和1200℃下,含Y涂层形成的氧化膜中的残余应力比不含Y中的高.对实验结果进行了分析.
Residual stresses of alumina scale formed at 1000, 1100 and 1200℃ on magnetron-sputtered Co-Cr-Al nanocoatings with and without yttrium additions have been measured using photo-stimulated luminescence spectroscopy (PSLS). The measured results are as follows: (1) the residual stresses of scale increase with increasing temperature; (2) the residual stresses are smaller on locations with transient oxidation than on the other region without transient oxidation; (3) the residual stresses of scale are close on both nanocoatings at 1000℃ but they are generally higher on Co-Cr-Al-Y nanocoating than on Co-Cr-Al at 1100 and 1200 ℃. The above results are also discussed.
出处
《金属学报》
SCIE
EI
CAS
CSCD
北大核心
2003年第10期1060-1064,共5页
Acta Metallurgica Sinica
基金
中国科学院"引进海外杰出人才"资助项目
