摘要
研究了利用(KOH+K3(Fe(CN)6)+H2O和H2SO4+H2O2)两种溶液浸蚀硬质合金基体,分别选择性刻蚀WC和Co的表面预处理过程.在浸蚀过的硬质合金基体上,用强电流直流伸展电弧等离子体CVD法沉积金刚石薄膜涂层.结果表明,两步混合处理法不仅可以有效地去除硬质合金基体表面的钻,而且还显著粗化硬质合金基体表面,提高了金刚石薄膜的质量和涂层的附着力.
A method of two-step surface pretreatment utilizing two kinds of solutions to etch respectively the surface WC and Co in cemented carbide substrates was investigated. Diamond films were deposited by means of the High Current Extended DC Arc Plasma CVD Equipment. The results showed that the two-step method can effectively remove the Co in cemented carbide substrates and obviously roughened the surface of the cemented carbide. Enhancements both on the quality and adhesion of the diamond coatings were observed.
出处
《北京科技大学学报》
EI
CAS
CSCD
北大核心
2003年第5期441-444,共4页
Journal of University of Science and Technology Beijing
基金
国家高技术研究与发展计划新材料领域"九五"重大项目(No.863-715238.03)
