摘要
本文介绍了亚微米电子束曝光机电流源系统。该系统在国内首次使用计算机实现了自动化调节,系统内关键部位使用了大量先进器件,多达20路独立可调的电流输出,稳定度均达到2×10^(-5)/1小时。其中对稳定度要求最高的物镜电源,由于首次将电压/频率转换器(VFC)用于连续可调的电源系统,形成了一个闭环反馈控制电路,使它达到5×10^(-6)/4小时的稳定度。该系统还具有很强的抗干扰能力,纹波<1×10^(-5)V_(P-P)。这些指标保证了0.1μm束斑的精度要求,它的研制成功为电子束曝光机的自动化调机奠定了基础。
This paper presents the current source system for sub-micrometer electron beam lithography system. Computer is firstly used in this system to realize the automatic adjusting. Many modern devices are adopted in the key parts of this system. Twenty independent adjustable current output have the stability of 2×10-5/1 hour.Because of the first use of Voltage-tp-Frequency Converter (VFC) in continuous adjusting current source system, a close-loop control circuit is formed. The objective lens current source which demands the best 'performance has the stability of 5×10-6/4 hours. This system has the high noise immunity and output ripple is less than 1×10-5VP-P. These characteristics ensure the precision of 0.1um electron-beam spot. Its success lays a substantial foundation for the experiment of the sub-micrometer electron beam lithography system.
出处
《微细加工技术》
1992年第3期7-14,共8页
Microfabrication Technology
关键词
曝光机
计算机控制
电子束光刻
electron beam lithography system
current source
computer control
