摘要
为了认识SiO2薄膜在激光辐照下的变化,本文以K9玻璃为基底,采用电子束热蒸发方法制备了SiO2薄膜,并将此组在相同实验条件下制备的薄膜加以不同能量的激光辐照,研究在激光辐照前后样片的透射率、折射率、消光系数、膜厚、表面形貌及激光损伤阈值(LIDT)的变化。结果表明,样片膜厚随激光能量的增加而减小,辐照激光能改善薄膜表面形貌,并使样片LIDT值提高,最终能使样片的LIDT值从16.96J/cm2提高至18.8J/cm2。
To recognize the variation of SiO2 films irradiated by the laser,SiO2 films were prepared by electron beam evaporating on K9substrates in the same experimental conditions with the exception that the irradiating laser energy was different in order to investigate the effects on the film′s transmittance,refractive index,extinction coefficient,film thickness,surface morphology and laser-induced damage threshold(LIDT).The result shows that irradiating laser can decrease the SiO2 films′thickness,and improve the surface roughness of films.Finally,the result means that irradiation can increase the LIDT of films from 16.96J/cm2 to 18.8J/cm2.
出处
《应用光学》
CAS
CSCD
北大核心
2014年第2期348-352,共5页
Journal of Applied Optics
基金
国家国际科技合作专项(2013DFR70620)
国家自然科学基金(61378050)
