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沉淀法制备超高致密度GZO陶瓷靶材用纳米氧化镓

Preparation of Ga_2O_3 Nano-particles Used for Ultrahigh Density GZO Ceramic Target by Precipitation Method
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摘要 为开发适合制备ZGO靶材的超细β-Ga2O3纳米粉末,以金属镓、硝酸、盐酸、氨水为原料,对化学沉淀法制备纳米氧化镓粉末的过程进行了研究。通过严格控制实验条件制备出了单斜相、粒度分布均匀的β-Ga2O3纳米粉末,并以其为原料制备了可直流磁控溅射的超高密度GZO陶瓷靶材。 In order to develop a kind of Ga2O3 nano-particles used for ZGO ceramic target, Ga2O3 nano-particles was prepared by chemical precipitation method using gallium, nitric acid, hydrochloric acid, ammonia as raw materials. Monoclinic β-Ga2O3 nano-particles with narrow distribution were synthesized by controlling the experimental conditions strictly, meanwhile the ultrahigh density GZO(ZnO:3 wt%β-Ga2O3)ceramic target for DC magnetron sputtering was prepared using those particles as raw material.
出处 《中国陶瓷》 CAS CSCD 北大核心 2014年第10期20-24,共5页 China Ceramics
基金 国家自然科学基金(51372093)
关键词 化学沉淀法 GA2O3 纳米粉末 GZO Chemical precipitation method Ga2O3 Nano-particles GZO
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参考文献10

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