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全息离子束刻蚀衍射光栅 被引量:26

Holographic ion beam etched diffraction gratings
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摘要 全息离子束刻蚀衍射光栅集中了机械刻划光栅的高效率和全息光栅的无鬼线、低杂散光、高信噪比的优点 .全息离子束刻蚀已作为常规工艺手段应用于真空紫外及软X射线衍射光栅的制作 .文章对全息离子束刻蚀衍射光栅的制作方法、主要类型。 A holographic ion beam etched diffraction grating collects has as high a diffraction efficiency as classical ruled gratings yet with no ghosts, lower stray light and higher signal-to-noise ratio, as with holographic gratings. Holographic ion beam etching has become a routine technique for fabricating vacuum ultraviolet and soft X-ray diffraction gratings. The fabrication process, main types and applications of these gratings in X\|ray space physics, synchrotron radiation and inertial confinement fusion are discussed briefly.
出处 《物理》 CAS 北大核心 2004年第5期340-344,共5页 Physics
基金 国家高技术研究发展计划 (批准号 :80 4-9-2 ) 中国科学院二期创新资助项目
关键词 衍射光栅 全息光刻 离子束刻蚀 全息光学 全息光栅 光栅制作 diffraction grating, holographic lithography, ion beam etching
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参考文献8

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二级参考文献18

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