A new type of bismuth silicate glass (Bi2O3-SiO2-ZnO-Al2O3-La2O3) doped with Tm2O3 is prepared by melt-quenching method. The thermal stability of the glass is examined by differential scanning calorimetry. No crystall...A new type of bismuth silicate glass (Bi2O3-SiO2-ZnO-Al2O3-La2O3) doped with Tm2O3 is prepared by melt-quenching method. The thermal stability of the glass is examined by differential scanning calorimetry. No crystallization peak is found. Using the absorption and emission spectra, the absorption and emission cross-sections are calculated. Their maximum data are 2.9×10-21cm2 at 1663 nm and 4.7×10-21cm2 at 1826 nm, respectively. Using the Judd-Ofelt theory, the radiation transition probabilities and radiative lifetimes are obtained. The extended overlap integral method is applied to analyze energy transfer process among the Tm3+ ions. The transfer constants of cross-relaxation and energy migration among the Tm3+ ions at the 3H4 level are 7.60×10-40 and 14.98×10-40 cm6 /s, respectively. The critical transfer radius for cross-relaxation is 0.99 nm. The cross relaxation process is easy to realize and is favorable for obtaining ～2-μm laser.展开更多
基金supported by the National Natural Science Foundation of China (No. 60937003)GFfoundation (No. GXJJ-11-M23).
文摘A new type of bismuth silicate glass (Bi2O3-SiO2-ZnO-Al2O3-La2O3) doped with Tm2O3 is prepared by melt-quenching method. The thermal stability of the glass is examined by differential scanning calorimetry. No crystallization peak is found. Using the absorption and emission spectra, the absorption and emission cross-sections are calculated. Their maximum data are 2.9×10-21cm2 at 1663 nm and 4.7×10-21cm2 at 1826 nm, respectively. Using the Judd-Ofelt theory, the radiation transition probabilities and radiative lifetimes are obtained. The extended overlap integral method is applied to analyze energy transfer process among the Tm3+ ions. The transfer constants of cross-relaxation and energy migration among the Tm3+ ions at the 3H4 level are 7.60×10-40 and 14.98×10-40 cm6 /s, respectively. The critical transfer radius for cross-relaxation is 0.99 nm. The cross relaxation process is easy to realize and is favorable for obtaining ～2-μm laser.
