A heavy-ion irradiation experiment is studied in digital storage cells with different design approaches in 130 nm CMOS bulk Si and silicon-on-insulator(SOI) technologies. The effectiveness of linear energy transfer(LE...A heavy-ion irradiation experiment is studied in digital storage cells with different design approaches in 130 nm CMOS bulk Si and silicon-on-insulator(SOI) technologies. The effectiveness of linear energy transfer(LET) with a tilted ion beam at the 130 nm technology node is obtained. Tests of tilted angles θ=0°,30°and 60°with respect to the normal direction are performed under heav.y-ion Kr with certain power whose LET is about 40 MeVcm^2/mg at normal incidence. Error numbers in D flip-flop chains are used to determine their upset sensitivity at different incidence angles. It is indicated that the effective LETs for SOI and bulk Si are not exactly in inverse proportion to cosθ, furthermore the effective LET for SOI is more closely in inverse proportion to cos θ compared to bulk Si, which are also the well known behavior. It is interesting that, if we design the sample in the dual interlocked storage cell approach, the effective LET in bulk Si will look like inversely proportional to cos 0 very well, which is also specifically explained.展开更多
Total ionizing dose induced single transistor latchup effects for 130 nm partially depleted silicon-on-insulator(PDSOI)NMOSFETs with the bodies floating were studied in this work. The latchup phenomenon strongly corre...Total ionizing dose induced single transistor latchup effects for 130 nm partially depleted silicon-on-insulator(PDSOI)NMOSFETs with the bodies floating were studied in this work. The latchup phenomenon strongly correlates with the bias configuration during irradiation. It is found that the high body doping concentration can make the devices less sensitive to the single transistor latchup effect, and the onset drain voltage at which latchup occurs can degrade as the total dose level rises. The mechanism of band-to-band tunneling(BBT) has been discussed. Two-dimensional simulations were conducted to evaluate the BBT effect. It is demonstrated that BBT combined with the positive trapped charge in the buried oxide(BOX) contributes a lot to the latchup effect.展开更多
The total dose effect of an AD678 with a BiMOS process is studied.We investigate the performance degradation of the device in different bias states and at several dose rates.The results show that an AD678 can endure 3...The total dose effect of an AD678 with a BiMOS process is studied.We investigate the performance degradation of the device in different bias states and at several dose rates.The results show that an AD678 can endure 3 krad(Si) at low dose rate and 5 krad(Si) at a high dose rate for static bias.The sensitive parameters to the bias states also differ distinctly.We find that the degradation is more serious on static bias.The underlying mechanisms are discussed in detail.展开更多
基金Supported by the Key Laboratory of Microsatellites,Chinese Academy of Sciences
文摘A heavy-ion irradiation experiment is studied in digital storage cells with different design approaches in 130 nm CMOS bulk Si and silicon-on-insulator(SOI) technologies. The effectiveness of linear energy transfer(LET) with a tilted ion beam at the 130 nm technology node is obtained. Tests of tilted angles θ=0°,30°and 60°with respect to the normal direction are performed under heav.y-ion Kr with certain power whose LET is about 40 MeVcm^2/mg at normal incidence. Error numbers in D flip-flop chains are used to determine their upset sensitivity at different incidence angles. It is indicated that the effective LETs for SOI and bulk Si are not exactly in inverse proportion to cosθ, furthermore the effective LET for SOI is more closely in inverse proportion to cos θ compared to bulk Si, which are also the well known behavior. It is interesting that, if we design the sample in the dual interlocked storage cell approach, the effective LET in bulk Si will look like inversely proportional to cos 0 very well, which is also specifically explained.
基金Project supported by Shanghai Municipal Natural Science Foundation,China(Grant No.15ZR1447100)
文摘Total ionizing dose induced single transistor latchup effects for 130 nm partially depleted silicon-on-insulator(PDSOI)NMOSFETs with the bodies floating were studied in this work. The latchup phenomenon strongly correlates with the bias configuration during irradiation. It is found that the high body doping concentration can make the devices less sensitive to the single transistor latchup effect, and the onset drain voltage at which latchup occurs can degrade as the total dose level rises. The mechanism of band-to-band tunneling(BBT) has been discussed. Two-dimensional simulations were conducted to evaluate the BBT effect. It is demonstrated that BBT combined with the positive trapped charge in the buried oxide(BOX) contributes a lot to the latchup effect.
文摘The total dose effect of an AD678 with a BiMOS process is studied.We investigate the performance degradation of the device in different bias states and at several dose rates.The results show that an AD678 can endure 3 krad(Si) at low dose rate and 5 krad(Si) at a high dose rate for static bias.The sensitive parameters to the bias states also differ distinctly.We find that the degradation is more serious on static bias.The underlying mechanisms are discussed in detail.
