在氢化物气相外延 (HVPE)生长 Ga N过程中 ,发现了一种在成核阶段向生长区添加额外 HCl来改善 Ga N外延薄膜质量的方法 ,并且讨论了额外 HCl和氮化对 Ga N形貌和质量的影响 .两种方法都可以大幅度地改善 Ga N的晶体质量和性质 ,但机理不...在氢化物气相外延 (HVPE)生长 Ga N过程中 ,发现了一种在成核阶段向生长区添加额外 HCl来改善 Ga N外延薄膜质量的方法 ,并且讨论了额外 HCl和氮化对 Ga N形貌和质量的影响 .两种方法都可以大幅度地改善 Ga N的晶体质量和性质 ,但机理不同 .氮化是通过在衬底表面形成 Al N小岛 ,促进了衬底表面的成核和薄膜的融合 ;而添加额外展开更多
Miniaturization of light-emitting diodes(LEDs) with sizes down to a few micrometers has become a hot topic in both academia and industry due to their attractive applications on self-emissive displays for high-definiti...Miniaturization of light-emitting diodes(LEDs) with sizes down to a few micrometers has become a hot topic in both academia and industry due to their attractive applications on self-emissive displays for high-definition televisions,augmented/mixed realities and head-up displays, and also on optogenetics, high-speed light communication, etc. The conventional top-down technology uses dry etching to define the LED size, leading to damage to the LED side walls.Since sizes of microLEDs approach the carrier diffusion length, the damaged side walls play an important role, reducing microLED performance significantly from that of large area LEDs. In this paper, we review our efforts on realization of microLEDs by direct bottom-up growth, based on selective area metal–organic vapor phase epitaxy. The individual LEDs based on either GaN nanowires or InGaN platelets are smaller than 1 μm in our approach. Such nano-LEDs can be used as building blocks in arrays to assemble microLEDs with different sizes, avoiding the side wall damage by dry etching encountered for the top-down approach. The technology of InGaN platelets is especially interesting since InGaN quantum wells emitting red, green and blue light can be grown on such platelets with a low-level of strain by changing the indium content in the InGaN platelets. This technology is therefore very attractive for highly efficient microLEDs of three primary colors for displays.展开更多
文摘在氢化物气相外延 (HVPE)生长 Ga N过程中 ,发现了一种在成核阶段向生长区添加额外 HCl来改善 Ga N外延薄膜质量的方法 ,并且讨论了额外 HCl和氮化对 Ga N形貌和质量的影响 .两种方法都可以大幅度地改善 Ga N的晶体质量和性质 ,但机理不同 .氮化是通过在衬底表面形成 Al N小岛 ,促进了衬底表面的成核和薄膜的融合 ;而添加额外
基金supported by the Swedish Research Council (VR),the Foundation for Strategic Research (SSF),the Knut and Alice Wallenberg foundation (KAW),the Swedish Energy Agency and Sweden’s innovation agency (VINNOVA)。
文摘Miniaturization of light-emitting diodes(LEDs) with sizes down to a few micrometers has become a hot topic in both academia and industry due to their attractive applications on self-emissive displays for high-definition televisions,augmented/mixed realities and head-up displays, and also on optogenetics, high-speed light communication, etc. The conventional top-down technology uses dry etching to define the LED size, leading to damage to the LED side walls.Since sizes of microLEDs approach the carrier diffusion length, the damaged side walls play an important role, reducing microLED performance significantly from that of large area LEDs. In this paper, we review our efforts on realization of microLEDs by direct bottom-up growth, based on selective area metal–organic vapor phase epitaxy. The individual LEDs based on either GaN nanowires or InGaN platelets are smaller than 1 μm in our approach. Such nano-LEDs can be used as building blocks in arrays to assemble microLEDs with different sizes, avoiding the side wall damage by dry etching encountered for the top-down approach. The technology of InGaN platelets is especially interesting since InGaN quantum wells emitting red, green and blue light can be grown on such platelets with a low-level of strain by changing the indium content in the InGaN platelets. This technology is therefore very attractive for highly efficient microLEDs of three primary colors for displays.
