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Determination of interface states and their time constant for Au/SnO_2 /n-Si (MOS) capacitors using admittance measurements
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作者 H. M. Baran a. tataroglu 《Chinese Physics B》 SCIE EI CAS CSCD 2013年第4期429-433,共5页
The frequency dependence of admittance measurements (capacitance–voltage (C–V ) and conductance–voltage (G/ω–V )) of Au/SnO2 /n-Si (MOS) capacitors was investigated by taking into account the effects of t... The frequency dependence of admittance measurements (capacitance–voltage (C–V ) and conductance–voltage (G/ω–V )) of Au/SnO2 /n-Si (MOS) capacitors was investigated by taking into account the effects of the interface states (N ss ) and series resistance (Rs ) at room temperature. Admittance measurements were carried out in frequency and bias voltage ranges of 1 kHz–1 MHz and ( 5V)–(+9V), respectively. The values of N ss and R s were determined by using a conductance method and estimating from the admittance measurements of the MOS capacitors. At low frequencies, the interface states can follow the AC signal and yield excess capacitance and conductance. In addition, the parallel conductance (G p /ω) versus log(f) curves at various voltages include a peak due to the presence of interface states. It is observed that the N ss and their time constant (τ) range from 1.23 ×10 12 eV-1 ·cm-2 to 1.47 ×10 12 eV-1 ·cm-2 and from 7.29 ×10-5 s to 1.81 ×10-5s, respectively. 展开更多
关键词 MOS capacitor admittance measurements interface states
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