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Facile synthesis of chromium chloride/poly(methyl methacrylate) core/shell nanocapsules by inverse miniemulsion evaporation method and application as delayed crosslinker in secondary oil recovery
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作者 Jing-Yang Pu keith p.johnston +4 位作者 Ping-Keng Wu Muaaz Ahmad Ming-Liang Luo Na Zhang Ju-Tao He 《Petroleum Science》 SCIE EI CAS CSCD 2023年第1期396-406,共11页
Cr(III)ehydrolyzed polyacrylamide(HPAM)gels have been extensively studied as a promising strategy controlling waste water production for mature oilfields.However,the gelation time of the current technologies is not lo... Cr(III)ehydrolyzed polyacrylamide(HPAM)gels have been extensively studied as a promising strategy controlling waste water production for mature oilfields.However,the gelation time of the current technologies is not long enough for in-depth placement.In this study,we report a novel synthesis method to obtain chromium chloride/poly(methyl methacrylate)(PMMA)nanocapsules which can significantly delay the gelation of HPAM through encapsulating the chromium chloride crosslinker.The chromium chloride-loaded nanocapsules(CreNC)are prepared via a facile inverse miniemulsion evaporation method during which the hydrophobic PMMA polymers,pre-dispersed in an organic solvent,were carefully controlled to precipitate onto stable aqueous miniemulsion droplets.The stable aqueous nanodroplets(W)containing Cr(III)are dispersed in a mixture of organic solvent(O1)with PMMA and nonsolvent medium(O2)to prepare an inverse miniemulsion.With the evaporation of the O1,PMMA forms CreNCs around the aqueous droplets.The CreNCs are readily transferred into water from the organic nonsolvent phase.The CreNCs exhibit the tunable size(358-983 nm),Cr loading(7.1%-19.1%),and Cr entrapment efficiency(11.7%-80.2%),with tunable zeta potentials in different PVA solutions.The CreNCs can delay release of Cr(III)and prolong the gelation time of HPAM up to 27 days. 展开更多
关键词 NANOCAPSULES Inverse miniemulsion evaporation Chromium chloride crosslinker HPAM gelation Secondary oil recovery
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超临界二氧化碳溶液体系集成处理新一代微电子器件研究进展 被引量:2
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作者 张小岗 keith p.johnston 《科学通报》 EI CAS CSCD 北大核心 2006年第20期2347-2352,共6页
微电子加工过程中要用到许多化学品和大量的超纯水,随着集成电路微型化和结构复杂程度的提高,各种溶液介质由于自身存在较大的表面张力而不容易穿透进入到微纳结构的内部,可能影响刻蚀、各种清洗和干燥等过程的正常进行.因此,在微电子... 微电子加工过程中要用到许多化学品和大量的超纯水,随着集成电路微型化和结构复杂程度的提高,各种溶液介质由于自身存在较大的表面张力而不容易穿透进入到微纳结构的内部,可能影响刻蚀、各种清洗和干燥等过程的正常进行.因此,在微电子加工过程中迫切需要引入新的技术和方法来应对这种挑战.超临界流体,尤其是超临界二氧化碳溶液体系,由于其具有独特的物理化学性质,而且临界条件相对较温和,有希望作为有机溶剂和化学品水溶液的替代品应用于微电子加工过程.本文介绍了在微电子核心加工过程中有潜在应用前景的旋转涂敷、微纳尺寸显影、表面硅烷化等有超临界二氧化碳参与的技术,重点对作者基于二氧化碳溶液体系清除刻蚀后多孔低介电材料微结构中的残余物,以及超临界二氧化碳溶液干燥光刻胶方面的研究工作进行评述,并讨论了其今后的发展方向. 展开更多
关键词 低介电材料清洗 光刻胶干燥 超临界二氧化碳
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