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Evaluation of Magnetic Field from Varied Permutation Power Transmission Line at High Technology Nano-Fab
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作者 Yu-Lin Song Chwen Yu +6 位作者 Feng-Chang Chuang Ying-Cheng Tseng Jyun-Yu Zou Sen-Kuei Hsu tzyh-ghuang ma Tzong-Lin Wu Luh-maan Chang 《Journal of Energy and Power Engineering》 2012年第2期299-303,共5页
In this study, the magnetic field was lessened by mirror array power cable system, and simulation of results predicted the best permutations to decrease electromagnetic influence (EMI) value below 0.4 mG at working ... In this study, the magnetic field was lessened by mirror array power cable system, and simulation of results predicted the best permutations to decrease electromagnetic influence (EMI) value below 0.4 mG at working space without any shielding. Furthermore, this innovative method will cost down at high technology nano-Fab especially for 28 nanometer process. Through the theoretical study and numerical simulation, we predict the best permutation for mitigating EMI noise from three-phase electric power lines system without any shielding system down to 1.2 mG in 3.0 m distance from applying I = 50 A at 60 Hz with 12 series cable tray system. Followed above discussions, this study indicated different and new perspectives with before opinions of some researcher. The measured magnetic field values on the nano-Fab are in good agreement with this simulation results. These good results give more confident to apply in new building nano-Fab system. Furthermore, this innovation will cost down for EMI shielding at high technology nano-Fab especially for 40 (and below) nanometer process. 展开更多
关键词 Magnetic filed optimal permutation electro-magnetic influence three phase electric power.
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Active Field Canceling System in Next Generation Nano-Fab
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作者 Feng-Chang Chuang Yu-Lin Song +5 位作者 Chwen Yu Sen-Kuei Hsu tzyh-ghuang ma Tzong-Lin Wu Ching-Yuan Yang Luh-maan Chang 《Journal of Energy and Power Engineering》 2012年第7期1163-1169,共7页
ELF (extremely low frequency) magnetic fields from power-line current influence the yield of CMOS foundry. The poor yield happens because of ELF magnetic fields inducing directly the measurement or process equipment... ELF (extremely low frequency) magnetic fields from power-line current influence the yield of CMOS foundry. The poor yield happens because of ELF magnetic fields inducing directly the measurement or process equipment for cutting-edge chips below 28 nm process. The equipments of electron microscopes, including SEM (scanning electron microscope), TEM (transmission electron microscopy), STEM (scanning transmission electron microscopy) and EBLS (electron beam lithography system) are very susceptible to ELF magnetic fields emanating from various electrical power sources outside of the building and within next generation CMOS foundry recommends a maximum of 0.3 mG. The active canceling method uses active coils with current sensing field via sensor and inducing man-made electromagnetic field to reduce the stray magnetic field. Unfortunately, the conventional system takes more time to products field because of parasitical capacitance and resistance in long coil. The longer canceling coil the system construct, the more time it takes. Besides, canceling system should spend more time on calibrating non-linear current amplifier through software design. This research designs simpler anti-electro-magnetic system instead of typical frame and develops one turn canceling coil structure to reduce delaying time. Several parallel cells generate field up to 23.81 mG controlled by MPU (micro processor unit). This system decreases the power-line inducing filed below 0.3 mG. 展开更多
关键词 Extremely low frequency power-line current CMOS foundry passive shielding actives shielding hybrid shielding.
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