By means of acid-base potentiometric titration and the advanced BEST computer program developed by Martell et al., the deprotonation constants of four inhibitors[Aminotrimethylenephosphoinic acid(ATMP), 2-phosphino-tu...By means of acid-base potentiometric titration and the advanced BEST computer program developed by Martell et al., the deprotonation constants of four inhibitors[Aminotrimethylenephosphoinic acid(ATMP), 2-phosphino-tutane-1,2,4-tricarboxylic acid(PBTCA), polyacrylic acid(PAA, M_w=2000), poly(maleic, acrylic) acid(PMAAA, M_w=3000)], and the stability constants of the complexes of these inhibitors with Ca 2+ have been determined. And the distribution curves of ATMP at different pH values in aqueous solutions have also been given out. The result of this study can be applied to explaining the inhibition mechanism.展开更多
The purpose of this article is to examine the methods and equipment for abating waste gases and water produced during the manufacture of semiconductor materials and devices. Three separating methods and equipment are ...The purpose of this article is to examine the methods and equipment for abating waste gases and water produced during the manufacture of semiconductor materials and devices. Three separating methods and equipment are used to control three different groups of electronic wastes. The first group includes arsine and phosphine emitted during the processes of semiconductor materials manufacture. The abatement procedure for this group of pollutants consists of adding iodates, cupric and manganese salts to a multiple shower tower (MST) structure. The second group includes pollutants containing arsenic, phosphorus, HF, HCl, NO 2, and SO 3 emitted during the manufacture of semiconductor materials and devices. The abatement procedure involves mixing oxidants and bases in an oval column with a separator in the middle. The third group consists of the ions of As, P and heavy metals contained in the waste water. The abatement procedure includes adding CaCO 3 and ferric salts in a flocculation sedimentation compact device equipment. Test results showed that all waste gases and water after the abatement procedures presented in this article passed the discharge standards set by the State Environmental Protection Administration of China.展开更多
文摘By means of acid-base potentiometric titration and the advanced BEST computer program developed by Martell et al., the deprotonation constants of four inhibitors[Aminotrimethylenephosphoinic acid(ATMP), 2-phosphino-tutane-1,2,4-tricarboxylic acid(PBTCA), polyacrylic acid(PAA, M_w=2000), poly(maleic, acrylic) acid(PMAAA, M_w=3000)], and the stability constants of the complexes of these inhibitors with Ca 2+ have been determined. And the distribution curves of ATMP at different pH values in aqueous solutions have also been given out. The result of this study can be applied to explaining the inhibition mechanism.
文摘The purpose of this article is to examine the methods and equipment for abating waste gases and water produced during the manufacture of semiconductor materials and devices. Three separating methods and equipment are used to control three different groups of electronic wastes. The first group includes arsine and phosphine emitted during the processes of semiconductor materials manufacture. The abatement procedure for this group of pollutants consists of adding iodates, cupric and manganese salts to a multiple shower tower (MST) structure. The second group includes pollutants containing arsenic, phosphorus, HF, HCl, NO 2, and SO 3 emitted during the manufacture of semiconductor materials and devices. The abatement procedure involves mixing oxidants and bases in an oval column with a separator in the middle. The third group consists of the ions of As, P and heavy metals contained in the waste water. The abatement procedure includes adding CaCO 3 and ferric salts in a flocculation sedimentation compact device equipment. Test results showed that all waste gases and water after the abatement procedures presented in this article passed the discharge standards set by the State Environmental Protection Administration of China.
