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Cleaning of carbon-contaminated optics using O2/Ar plasma
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作者 Yi-Fei Zhang Hong-Xin Luo +3 位作者 Zhi Guo xiang-jun zhen Ming Chen Jun-Nan Liu 《Nuclear Science and Techniques》 SCIE CAS CSCD 2017年第9期16-20,共5页
Cleaning of carbon-contaminated beamline optics was studied by RF plasma discharge process using O_2/Ar. Carbon-coated samples were prepared, and through their cleaning processes key parameters were determined,such as... Cleaning of carbon-contaminated beamline optics was studied by RF plasma discharge process using O_2/Ar. Carbon-coated samples were prepared, and through their cleaning processes key parameters were determined,such as the optimal RF output power, mixing rates of O_2/Ar, and chamber vacuum. Considerations were made against possible adverse effects in cleaning the beamline optics, such as comparing the roughness of samples before and after cleaning, and possible detrimental kinetic effects on cable insulation. Under the cleaning parameters to clean the beamline optics, the thickness of removed carbon film and the change in beamline photon flux were analyzed. 展开更多
关键词 等离子体清洗 光学参数 碳污染 射频等离子体 表面粗糙度 动力学效应 光束线
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