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Generating Microstructures with Highly Variable Mechanical Performance using Two-Photon Lithography and Thiol-ene Photopolymerization 被引量:2
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作者 Xiao Yang yan-fang niu +4 位作者 Meng-Xiao Wei Jun-Ning Zhang Ke-Liang Liu Xin Du Zhong-Ze Gu 《Chinese Journal of Polymer Science》 SCIE EI CAS CSCD 2023年第1期67-74,共8页
In this study,we investigate the effect of the exposure dose on the mechanical property of the photoresins generated with acrylate self-polymerization and thiol-ene polymerization.The results indicate that the mechani... In this study,we investigate the effect of the exposure dose on the mechanical property of the photoresins generated with acrylate self-polymerization and thiol-ene polymerization.The results indicate that the mechanical performance of the thiol-ene photoresin is highly depended on the exposure dose during the solidification process.With 350-fold exposure dose change,the stiffness of the thiol-ene photoresin reached more that 700-fold change compare to 14-fold of the acrylate photoresin.We developed a TPL photoresist based on our results and show the capability to fabricate microstrucutres with high resolution and variable mechanical performances using this method. 展开更多
关键词 THIOL-ENE Two photo lithography 3D printing PHOTORESIST
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