期刊文献+
共找到1篇文章
< 1 >
每页显示 20 50 100
Accuracy design of ultra-low residual reflection coatings for laser optics
1
作者 刘华松 杨霄 +7 位作者 王利栓 焦宏飞 季一勤 张锋 刘丹丹 姜承慧 姜玉刚 陈德应 《Chinese Physics B》 SCIE EI CAS CSCD 2017年第7期393-398,共6页
Refractive index inhomogeneity is one of the important characteristics of optical coating material, which is one of the key factors to produce loss to the ultra-low residual reflection coatings except using the refrac... Refractive index inhomogeneity is one of the important characteristics of optical coating material, which is one of the key factors to produce loss to the ultra-low residual reflection coatings except using the refractive index inhomogeneity to obtain gradient-index coating. In the normal structure of antireflection coatings for center wavelength at 532 nm, the physical thicknesses of layer H and layer L are 22.18 nm and 118.86 nm, respectively. The residual reflectance caused by refractive index inhomogeneity(the degree of inhomogeneous is between -0.2 and 0.2) is about 200 ppm, and the minimum reflectivity wavelength is between 528.2 nm and 535.2 nm. A new numerical method adding the refractive index inhomogeneity to the spectra calculation was proposed to design the laser antireflection coatings, which can achieve the design of antireflection coatings with ppm residual reflection by adjusting physical thickness of the couple layers. When the degree of refractive index inhomogeneity of the layer H and layer L is-0.08 and 0.05 respectively, the residual reflectance increase from zero to 0.0769% at 532 nm. According to the above accuracy numerical method, if layer H physical thickness increases by 1.30 nm and layer L decrease by 4.50 nm, residual reflectance of thin film will achieve to 2.06 ppm. When the degree of refractive index inhomogeneity of the layer H and layer L is 0.08 and -0.05 respectively, the residual reflectance increase from zero to 0.0784% at 532 nm. The residual reflectance of designed thin film can be reduced to 0.8 ppm by decreasing the layer H of 1.55 nm while increasing the layer L of 4.94 nm. 展开更多
关键词 ultra-low residual reflectance antireflection coatings for laser optics refractive index inhomogeneity accuracy design
原文传递
上一页 1 下一页 到第
使用帮助 返回顶部