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Effects of the ion-beam voltage on the properties of the diamond-like carbon thin film prepared by ion-beam sputtering deposition 被引量:1
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作者 孙鹏 胡明 +4 位作者 张锋 季一勤 刘华松 刘丹丹 冷健 《Chinese Physics B》 SCIE EI CAS CSCD 2015年第6期581-585,共5页
Diamond-like carbon (DLC) thin film is one of the most widely used optical thin films. The fraction of chemical bondings has a great influence on the properties of the DLC film. In this work, DLC thin films are prep... Diamond-like carbon (DLC) thin film is one of the most widely used optical thin films. The fraction of chemical bondings has a great influence on the properties of the DLC film. In this work, DLC thin films are prepared by ion-beam sputtering deposition in Ar and CH4 mixtures with graphite as the target. The influences of the ion-beam voltage on the surface morphology, chemical structure, mechanical and infrared optical properties of the DLC films are investigated by atomic force microscopy (AFM), Raman spectroscopy, nanoindentation, and Fourier transform infrared (FTIR) spec- troscopy, respectively. The results show that the surface of the film is uniform and smooth. The film contains sp2 and sp3 hybridized carbon bondings. The film prepared by lower ion beam voltage has a higher sp3 bonding content. It is found that the hardness of DLC films increases with reducing ion-beam voltage, which can be attributed to an increase in the fraction of sp3 carbon bondings in the DLC film. The optical constants can be obtained by the whole infrared optical spectrum fitting with the transmittance spectrum. The refractive index increases with the decrease of the ion-beam voltage, while the extinction coefficient decreases. 展开更多
关键词 DLC thin film ion-beam sputtering deposition chemical bondings infrared optical and mechani-cal properties
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Surface Metallization of Glass Fiber(GF)/Polyetheretherketone(PEEK) Composite with Cu Coatings Deposited by Magnetron Sputtering and Electroplating 被引量:1
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作者 钟利 金凡亚 +2 位作者 朱剑豪 TONG Honghui DAN Min 《Journal of Wuhan University of Technology(Materials Science)》 SCIE EI CAS CSCD 2024年第1期213-220,共8页
Surface metallization of glass fiber(GF)/polyetheretherketone(PEEK)[GF/PEEK] is conducted by coating copper using electroplating and magnetron sputtering and the properties are determined by X-ray diffraction(XRD), sc... Surface metallization of glass fiber(GF)/polyetheretherketone(PEEK)[GF/PEEK] is conducted by coating copper using electroplating and magnetron sputtering and the properties are determined by X-ray diffraction(XRD), scanning electron microscopy(SEM), and electron backscatter diffraction(EBSD).The coating bonding strength is assessed by pull-out tests and scribing in accordance with GB/T 9286-1998.The results show that the Cu coating with a thickness of 30 μm deposited on GF/PEEK by magnetron sputtering has lower roughness, finer grain size, higher crystallinity, as well as better macroscopic compressive stress,bonding strength, and electrical conductivity than the Cu coating deposited by electroplating. 展开更多
关键词 surface metallization Cu coating magnetron sputtering ELECTROPLATING
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Analysis and prediction of sputtering yield using combined hierarchical clustering analysis and artificial neural network algorithms
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作者 Yu CHEN Jiawei LUO +2 位作者 Wen LEI Yan SHEN Shuai CAO 《Plasma Science and Technology》 SCIE EI CAS CSCD 2024年第11期162-169,共8页
Sputtering is a crucial technology in fields such as electric propulsion, materials processing and semiconductors. Modeling of sputtering is significant for improving thruster design and designing material processing ... Sputtering is a crucial technology in fields such as electric propulsion, materials processing and semiconductors. Modeling of sputtering is significant for improving thruster design and designing material processing control algorithms. In this study we use the hierarchical clustering analysis algorithm to perform cluster analysis on 17 descriptors related to sputtering. These descriptors are divided into four fundamental groups, with representative descriptors being the mass of the incident ion, the formation energy of the incident ion, the mass of the target and the formation energy of the target. We further discuss the possible physical processes and significance involved in the classification process, including cascade collisions, energy transfer and other processes. Finally, based on the analysis of the above descriptors, several neural network models are constructed for the regression of sputtering threshold E_(th), maximum sputtering energy E_(max) and maximum sputtering yield SY_(max). In the regression model based on 267 samples, the four descriptor attributes showed higher accuracy than the 17 descriptors(R^(2) evaluation) in the same neural network structure, with the 5×5 neural network structure achieving the highest accuracy, having an R^(2) of 0.92. Additionally, simple sputtering test data also demonstrated the generalization ability of the 5×5 neural network model, the error in maximum sputtering yield being less than 5%. 展开更多
关键词 sputtering machine learning PLASMA
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Structural and magnetic properties of micropolycrystalline cobalt thin films fabricated by direct current magnetron sputtering
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作者 Kerui Song Zhou Li +2 位作者 Mei Fang Zhu Xiao Qian Lei 《International Journal of Minerals,Metallurgy and Materials》 SCIE EI CAS CSCD 2024年第2期384-394,共11页
Pure cobalt(Co)thin films were fabricated by direct current magnetron sputtering,and the effects of sputtering power and pres-sure on the microstructure and electromagnetic properties of the films were investigated.As... Pure cobalt(Co)thin films were fabricated by direct current magnetron sputtering,and the effects of sputtering power and pres-sure on the microstructure and electromagnetic properties of the films were investigated.As the sputtering power increases from 15 to 60 W,the Co thin films transition from an amorphous to a polycrystalline state,accompanied by an increase in the intercrystal pore width.Simultaneously,the resistivity decreases from 276 to 99μΩ·cm,coercivity increases from 162 to 293 Oe,and in-plane magnetic aniso-tropy disappears.As the sputtering pressure decreases from 1.6 to 0.2 Pa,grain size significantly increases,resistivity significantly de-creases,and the coercivity significantly increases(from 67 to 280 Oe),which can be attributed to the increase in defect width.Corres-pondingly,a quantitative model for the coercivity of Co thin films was formulated.The polycrystalline films sputtered under pressures of 0.2 and 0.4 Pa exhibit significant in-plane magnetic anisotropy,which is primarily attributable to increased microstress. 展开更多
关键词 cobalt thin film magnetron sputtering microstructure electromagnetic properties
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Preparation and Properties of Cu-Containing High-entropy Alloy Nitride Films by Magnetron Sputtering on Titanium Alloy
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作者 DENG Wanrong YANG Wei +5 位作者 YU Sen LAN Nan MA Xiqun WANG Liqun GAO Wei CHEN Jian 《Journal of Wuhan University of Technology(Materials Science)》 SCIE EI CAS CSCD 2024年第6期1586-1594,共9页
Magnetron sputtering deposition with regulated Cu target power was used for depositing Cu-containing high-entropy alloy nitride(Cu-(HEA)N)films on TC4 titanium alloy substrates.The microscopic morphologies,surface com... Magnetron sputtering deposition with regulated Cu target power was used for depositing Cu-containing high-entropy alloy nitride(Cu-(HEA)N)films on TC4 titanium alloy substrates.The microscopic morphologies,surface compositions,and thicknesses of the films were characterized using SEM+EDS;the anti-corrosion,wear resistance and antibacterial properties of the films in simulated seawater were investigated.The experimental results show that all four Cu-(HEA)N films are uniformly dense and contained nanoparticles.The film with Cu doping come into contact with oxygen in the air to form cuprous oxide.The corrosion resistance of the(HEA)N film without Cu doping on titanium alloy is better than the films with Cu doping.The Cu-(HEA)N film with Cu target power of 16 W shows the best wear resistance and antibacterial performance,which is attributed to the fact that Cu can reduce the coefficient of friction and exacerbate corrosion,and the formation of cuprous oxide has antibacterial properties.The findings of this study provide insights for engineering applications of TC4 in the marine field. 展开更多
关键词 titanium alloy high-entropy alloy nitride film magnetron sputtering properties
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Effects of power on ion behaviors in radio-frequency magnetron sputtering of indium tin oxide(ITO)
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作者 李茂洋 莫超超 +7 位作者 陈佳丽 季佩宇 谭海云 张潇漫 崔美丽 诸葛兰剑 吴雪梅 黄天源 《Plasma Science and Technology》 SCIE EI CAS CSCD 2024年第7期116-122,共7页
This study delves into ion behavior at the substrate position within RF magnetron discharges utilizing an indium tin oxide(ITO)target.The positive ion energies exhibit an upward trajectory with increasing RF power,att... This study delves into ion behavior at the substrate position within RF magnetron discharges utilizing an indium tin oxide(ITO)target.The positive ion energies exhibit an upward trajectory with increasing RF power,attributed to heightened plasma potential and initial emergent energy.Simultaneously,the positive ion flux escalates owing to amplified sputtering rates and electron density.Conversely,negative ions exhibit broad ion energy distribution functions(IEDFs)characterized by multiple peaks.These patterns are clarified by a combination of radiofrequency oscillation of cathode voltage and plasma potential,alongside ion transport time.This elucidation finds validation in a one-dimensional model encompassing the initial ion energy.At higher RF power,negative ions surpassing 100 e V escalate in both flux and energy,posing a potential risk of sputtering damages to ITO layers. 展开更多
关键词 RF magnetron sputtering ITO film ion energy distribution functions plasma diagnosis
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Study of bias voltage effect on the performance of ta-C coating prepared by high power impulse magnetron sputtering
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作者 冯利民 何哲秋 +2 位作者 严森 李建中 石俊杰 《China Welding》 CAS 2024年第1期7-12,共6页
The mechanical and frictional properties of ta-C coatings deposited on the substrate surface affect applications in the field of cutting tools and wear-resistant components.In this paper,the effect of bias parameters ... The mechanical and frictional properties of ta-C coatings deposited on the substrate surface affect applications in the field of cutting tools and wear-resistant components.In this paper,the effect of bias parameters on the performance of ta-C coatings was investigated based on high power impulse magnetron sputtering(HiPIMS)technology.The results show that bias voltage has a significant effect on the deposition rate,structure,and wear resistance of the coating.In the range of bias voltage−50 V to−200 V,the ta-C coating performance was the best under bias voltage−150 V.The thickness reached 530.4 nm,the hardness value reached 35.996 GPa,and the bonding force in-creased to 14.2 N.The maximum sp3 bond content was 59.53% at this condition. 展开更多
关键词 bias voltage magnetron sputtering deposition rate wear resistance
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The influence of sequence of precursor films on CZTSe thin films prepared by ion-beam sputtering deposition
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作者 Jun Zhao Guangxing Liang +4 位作者 Yang Zeng Ping Fan Juguang Hu Jingting Luo Dongping Zhang 《Journal of Semiconductors》 EI CAS CSCD 2017年第2期15-19,共5页
The CuZnSn(CZT) precursor thin films are grown by ion-beam sputtering Cu, Zn, Sn targets with different orders and then sputtering Se target to fabricate Cu_2ZnSnSe_4(CZTSe) absorber thin films on molybdenum subst... The CuZnSn(CZT) precursor thin films are grown by ion-beam sputtering Cu, Zn, Sn targets with different orders and then sputtering Se target to fabricate Cu_2ZnSnSe_4(CZTSe) absorber thin films on molybdenum substrates. They are annealed in the same vacuum chamber at 400 ℃. The characterization methods of CZTSe thin films include X-ray diffraction(XRD), energy dispersive spectroscopy(EDS), scanning electron microscopy(SEM), and X-ray photoelectron spectra(XPS) in order to study the crystallographic properties, composition, surface morphology, electrical properties and so on. The results display that the CZTSe thin films got the strongest diffraction peak intensity and were with good crystalline quality and its morphology appeared smooth and compact with a sequence of Cu/Zn/Sn/Se, which reveals that the expected states for CZTSe are Cu^(1+), Zn^(2+), Sn^(4+), Se^(2).With the good crystalline quality and close to ideal stoichiometric ratio the resistivity of the CZTSe film with the sequence of Cu/Zn/Sn/Se is lower, whose optical band gap is about 1.50 eV. 展开更多
关键词 CZTSe thin films ion-beam sputtering chalcogenide
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High Permeability in Broadband of Co-sputtered [Fe-Fe_(20)Ni_(80)/Cr]_(n) Multilayer Films 被引量:1
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作者 罗创钰 LIU Xing +1 位作者 王峰 李维 《Journal of Wuhan University of Technology(Materials Science)》 SCIE EI CAS CSCD 2024年第2期410-416,共7页
To achieve high microwave permeability in wide-band for the micron-thick magnetic films,[Fe-Fe_(20)Ni_(80)/Cr]_(n) multilayer structure was proposed by co-sputtering Fe and FeNi to form the magnetic layers and Cr to f... To achieve high microwave permeability in wide-band for the micron-thick magnetic films,[Fe-Fe_(20)Ni_(80)/Cr]_(n) multilayer structure was proposed by co-sputtering Fe and FeNi to form the magnetic layers and Cr to form the interlayers.The multilayer structure contributes to the high permeability by reducing the coercivity and diminishing out-of-plane magnetization.The maximum imaginary permeability of[Fe-Fe_(20)Ni_(80)/Cr]_(n) multilayer film reaches a large value of 800 at 0.52 GHz even though its overall thickness exceeds 1μm.Besides,the magnetic resonance frequency of the multilayer film can be modulated from 0.52 to 1.35 GHz by adjusting the sputtering power of Fe from 0 to 86 W,and its bandwidth for μ’’>200(Δf) is as large as 2.0 GHz.The desirable broad Δf of magnetic permeability,which can be well fitted by the Landau-Lifshitz-Gilbert equations,is due to dual magnetic resonances originated from double magnetic phases of Fe and FeNi that are of different saturation magnetization.The micron-thick multilayer films with high permeability in extended waveband are promising candidate for electromagnetic noise suppression application. 展开更多
关键词 magnetron sputtering multiple magnetic resonance high permeability electromagnetic noise suppression
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Facile integration of an Al-rich Al_(1-x)In_(x)N photodetector on free-standing GaN by radio-frequency magnetron sputtering
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作者 刘新科 林之晨 +12 位作者 林钰恒 陈建金 邹苹 周杰 李博 沈龙海 朱德亮 刘强 俞文杰 黎晓华 顾泓 王新中 黄双武 《Chinese Physics B》 SCIE EI CAS CSCD 2023年第11期591-597,共7页
Al_(1-x)In_(x)N, a Ⅲ-nitride semiconductor material, is currently of great research interest due to its remarkable physical properties and chemical stability. When the Al and In compositions are tuned, its band-gap e... Al_(1-x)In_(x)N, a Ⅲ-nitride semiconductor material, is currently of great research interest due to its remarkable physical properties and chemical stability. When the Al and In compositions are tuned, its band-gap energy varies from 0.7 eV to 6.2 eV, which shows great potential for application in photodetectors. Here, we report the fabrication and performance evaluation of integrated Al_(1-x)In_(x)N on a free-standing GaN substrate through direct radio-frequency magnetron sputtering.The optical properties of Al_(1-x)In_(x)N will be enhanced by the polarization effect of a heterostructure composed of Al_(1-x)In_(x)N and other Ⅲ-nitride materials. An Al_(1-x)In_(x)N/Ga N visible-light photodetector was prepared by semiconductor fabrication technologies such as lithography and metal deposition. The highest photoresponsivity achieved was 1.52 A·W^(-1)under 365 nm wavelength illumination and the photodetector was determined to have the composition Al0.75In0.25N/GaN.A rise time of 0.55 s was observed after transient analysis of the device. The prepared Al_(1-x)In_(x)N visible-light photodetector had a low dark current, high photoresponsivity and fast response speed. By promoting a low-cost, simple fabrication method,this study expands the application of ternary alloy Al_(1-x)In_(x)N visible-light photodetectors in optical communication. 展开更多
关键词 Ali-xIn N PHOTODETECTOR GAN radio-frequency magnetron sputtering ternary alloy
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Poloidal magnetic field reconstruction by laser-driven ion-beam trace probe in spherical tokamak
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作者 Zuyu ZHANG Tianchao XU +4 位作者 Chijie XIAO Xianli HUANG Renchuan HE Ruixin YUAN Xiaoyi YANG 《Plasma Science and Technology》 SCIE EI CAS CSCD 2024年第11期58-64,共7页
The poloidal magnetic field( B_(p)) plays a critical role in plasma equilibrium, confinement and transport of magnetic confinement devices. Multiple diagnostic methods are needed to complement each other to obtain a m... The poloidal magnetic field( B_(p)) plays a critical role in plasma equilibrium, confinement and transport of magnetic confinement devices. Multiple diagnostic methods are needed to complement each other to obtain a more accurate B_(p) profile. Recently, the laser-driven ion-beam trace probe(LITP) has been proposed as a promising tool for diagnosing B_(p) and radial electric field( E_(r)) profiles in tokamaks [Yang X Y et al 2014 Rev. Sci. Instrum. 85 11E429]. The spherical tokamak(ST) is a promising compact device with high plasma beta and naturally large elongation. However, when applying LITP to diagnosing B_(p) in STs, the larger B_(p) invalidates the linear reconstruction relationship for conventional tokamaks, necessitating the development of a nonlinear reconstruction principle tailored to STs. This novel approach employs an iterative reconstruction method based on Newton's method to solve the nonlinear equation. Subsequently,a simulation model to reconstruct the B_(p) profile of STs is developed and the experimental setup of LITP is designed for EXL-50, a middle-sized ST. Simulation results of the reconstruction show that the relative errors of B_(p) reconstruction are mostly below 5%. Moreover, even with 5 mm measurement error on beam traces or 1 cm flux surface shape error, the average relative error of reconstruction remains below 15%, initially demonstrating the robustness of LITP in diagnosing B_(p) profiles in STs. 展开更多
关键词 laser-driven ion-beam trace probe poloidal magnetic field diagnostic iterative reconstruction
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Investigation on the properties of high reflective mirror prepared by ion-beam sputtering
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作者 黄建兵 田光磊 +1 位作者 邵建达 范正修 《Chinese Optics Letters》 SCIE EI CAS CSCD 2005年第11期676-678,共3页
The single-sided and dual-sided high reflective mirrors were deposited with ion-beam sputtering (IBS). When the incident light entered with 45°, the reflectance of p-polarized light at 1064 nm exceeded 99.5%. S... The single-sided and dual-sided high reflective mirrors were deposited with ion-beam sputtering (IBS). When the incident light entered with 45°, the reflectance of p-polarized light at 1064 nm exceeded 99.5%. Spectrum was gained by spectrometer and weak absorption of coatings was measured by surface thermal lensing (STL) technique. Laser-induced damage threshold (LIDT) was determined and the damage morphology was observed with Lecia-DMRXE microscope simultaneously. The profile of coatings was measured with Mark III-GPI digital interferometer. It was found that the reflectivity of mirror exceeded 99.9% and its absorption was as low as 14 ppm. The reflective bandwidth of the dual-sided sample was about 43 nm wider than that of single-sided sample, and its LIDT was as high as 28 J/cm^2, which was 5 J/cm^2 higher than that of single-sided sample. Moreover, the profile of dual-sided sample was better than that of substrate without coatings. 展开更多
关键词 Coatings INTERFEROMETERS Ion beams Laser damage Light polarization MICROSCOPES Reflection sputtering
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Exploring negative ion behaviors and their influence on properties of DC magnetron sputtered ITO films under varied power and pressure conditions
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作者 Maoyang Li Chaochao Mo +6 位作者 Peiyu Ji Xiaoman Zhang Jiali Chen Lanjian Zhuge Xuemei Wu Haiyun Tan Tianyuan Huang 《Chinese Physics B》 SCIE EI CAS CSCD 2024年第10期442-449,共8页
We deposited indium-tin-oxide(ITO)films on silicon and quartz substrates by magnetron sputtering technology in pure argon.Using electrostatic quadrupole plasma diagnostic technology,we investigate the effects of disch... We deposited indium-tin-oxide(ITO)films on silicon and quartz substrates by magnetron sputtering technology in pure argon.Using electrostatic quadrupole plasma diagnostic technology,we investigate the effects of discharge power and discharge pressure on the ion flux and energy distribution function of incidence on the substrate surface,with special attention to the production of high-energy negative oxygen ions,and elucidate the mechanism behind its production.At the same time,the structure and properties of ITO films are systematically characterized to understand the potential effects of high energy oxygen ions on the growth of ITO films.Combining with the kinetic property analysis of sputtering damage mechanism of transparent conductive oxide(TCO)thin films,this study provides valuable physical understanding of optimization of TCO thin film deposition process. 展开更多
关键词 magnetron sputtering ion energy ITO thin film high energy oxygen anion
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Effect of substrate temperature and oxygen plasma treatment on the properties of magnetron-sputtered CdS for solar cell applications
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作者 Runxuan Zang Haolin Wang +9 位作者 Xiaoqi Peng Ke Li Yuehao Gu Yizhe Dong Zhihao Yan Zhiyuan Cai Huihui Gao Shuwei Sheng Rongfeng Tang Tao Chen 《中国科学技术大学学报》 CAS CSCD 北大核心 2024年第6期22-33,I0010,共13页
Cadmium sulfide(CdS)is an n-type semiconductor with excellent electrical conductivity that is widely used as an electron transport material(ETM)in solar cells.At present,numerous methods for preparing CdS thin films h... Cadmium sulfide(CdS)is an n-type semiconductor with excellent electrical conductivity that is widely used as an electron transport material(ETM)in solar cells.At present,numerous methods for preparing CdS thin films have emerged,among which magnetron sputtering(MS)is one of the most commonly used vacuum techniques.For this type of technique,the substrate temperature is one of the key deposition parameters that affects the interfacial properties between the target film and substrate,determining the specific growth habits of the films.Herein,the effect of substrate temperature on the microstructure and electrical properties of magnetron-sputtered CdS(MS-CdS)films was studied and applied for the first time in hydrothermally deposited antimony selenosulfide(Sb_(2)(S,Se)_(3))solar cells.Adjusting the substrate temperature not only results in the design of the flat and dense film with enhanced crystallinity but also leads to the formation of an energy level arrangement with a Sb_(2)(S,Se)_(3)layer that is more favorable for electron transfer.In addition,we developed an oxygen plasma treatment for CdS,reducing the parasitic absorption of the device and resulting in an increase in the short-circuit current density of the solar cell.This study demonstrates the feasibility of MS-CdS in the fabrication of hydrothermal Sb_(2)(S,Se)_(3)solar cells and provides interface optimization strategies to improve device performance. 展开更多
关键词 magnetron sputtering CDS substrate heating plasma treatment Sb_(2)(S Se)_(3) thin film solar cell
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Synthesis of One-Dimensional ZnO Na norods by Oxidating Zinc Films Deposited with Magnetron Sputtering 被引量:5
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作者 石礼伟 李玉国 +2 位作者 王强 薛成山 王书运 《Journal of Semiconductors》 EI CAS CSCD 北大核心 2004年第10期1211-1214,共4页
One-dimensional ZnO nanorods are synthesized by ox idating thin metal zinc films deposited on Si(111) substrates with radio frequen cy magnetron sputtering.The crystal structure,surface morphology,and optical pro per... One-dimensional ZnO nanorods are synthesized by ox idating thin metal zinc films deposited on Si(111) substrates with radio frequen cy magnetron sputtering.The crystal structure,surface morphology,and optical pro perties of nanorods are investigated.X-ray diffraction(XRD) pattern,scanning el ectron microscopy(SEM),and transmission electron microscopy(TEM) analyses show t hat the synthesized single-crystal ZnO nanorods develop like hairpins along dif ferent radials,with a hexagonal wurtzite structure.The diameters of nanorods ran ge between 30 and 60nm and lengths up to micrometers.Photoluminescence(PL) analy sis shows that,under 280nm light excitation,a strong and sharp near band-edge U V light emission band at 372nm and a relatively weak green deep-level light emi ssion band at 516nm are observed from the ZnO nanorods,which indicates excellent crystallization and optical quality of the fabricated ZnO nanorods. 展开更多
关键词 magnetron sputtering thermal oxidation ZNO nan orods properties
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Structural and optoelectronic properties of AZO thin films prepared by RF magnetron sputtering at room temperature 被引量:3
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作者 孙宜华 王海林 +2 位作者 陈剑 方亮 王磊 《Transactions of Nonferrous Metals Society of China》 SCIE EI CAS CSCD 2016年第6期1655-1662,共8页
Al-doped ZnO thin films were prepared on glass substrate using an ultra-high density target by RF magnetron sputtering at room temperature. The microstructure, surface morphology, optical and electrical properties of ... Al-doped ZnO thin films were prepared on glass substrate using an ultra-high density target by RF magnetron sputtering at room temperature. The microstructure, surface morphology, optical and electrical properties of AZO thin films were investigated by X-ray diffractometer, scanning electron microscope, UV-visible spectrophotometer, four-point probe method, and Hall-effect measurement system. The results showed that all the films obtained were polycrystalline with a hexagonal structure and average optical transmittance of AZO thin films was over 85 % at different sputtering powers. The sputtering power had a great effect on optoelectronic properties of the AZO thin films, especially on the resistivity. The lowest resistivity of 4.5×10^-4 Ω·cm combined with the transmittance of 87.1% was obtained at sputtering power of 200 W. The optical band gap varied between 3.48 and 3.68 eV. 展开更多
关键词 AZO thin film microstructure optoelectronic properties RF magnetron sputtering
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Microstructures of TiN,TiAlN and TiAlVN coatings on AISI M2 steel deposited by magnetron reactive sputtering 被引量:5
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作者 王翠凤 欧士辅 邱锡荣 《Transactions of Nonferrous Metals Society of China》 SCIE EI CAS CSCD 2014年第8期2559-2565,共7页
In order to study the effect of the microstructure with Al and V added TiN coatings, TiN, TiAlN and TiAlVN coatings were deposited on AISI M2 high-speed steels by magnetron reactive sputtering. The microstructures of ... In order to study the effect of the microstructure with Al and V added TiN coatings, TiN, TiAlN and TiAlVN coatings were deposited on AISI M2 high-speed steels by magnetron reactive sputtering. The microstructures of all the coatings were characterized by X-ray diffraction (XRD), scanning electron microscopy (SEM) and transmission electron microscopy (TEM). The results indicate that the addition of Al into TiN coatings reduces their lattice constant, but a further addition of V into TiAlN coatings increases their lattice constant. Moreover, the growth morphologies for TiN, TiAlN, and TiAlVN indicate that adding Al and V has a tendency to improve the columnar structure. The (111) and (200) orientations of TiN, TiAlN, and TiAlVN are identified. Theε(Fe3N-Fe2N) phase occurs because a small amount of Fe is present in the coatings. The interlayers of TiAlN and TiAlVN have the preferred (01 1 0) orientation. The texture (columnar) structure of the (111) and (200) orientations is observed in the TiAlN and TiAlVN coatings. An orientation relationship of (01 1 0)α-Ti//(110)T.M occurs between the interlayer and tempered martensite (T.M) in TiAlVN. 展开更多
关键词 COATING TiAlVN coating sputtering yield crystallographic relationship
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Effects of sputtering pressure on nanostructure and nanomechanical properties of AlN films prepared by RF reactive sputtering 被引量:2
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作者 魏秋平 张雄伟 +4 位作者 刘丹瑛 李劼 周科朝 张斗 余志明 《Transactions of Nonferrous Metals Society of China》 SCIE EI CAS CSCD 2014年第9期2845-2855,共11页
Wurtzite aluminum nitride(AlN) films were deposited on Si(100) wafers under various sputtering pressures by radio-frequency(RF) reactive magnetron sputtering. The film properties were investigated by XRD, SEM, A... Wurtzite aluminum nitride(AlN) films were deposited on Si(100) wafers under various sputtering pressures by radio-frequency(RF) reactive magnetron sputtering. The film properties were investigated by XRD, SEM, AFM, XPS and nanoindenter techniques. It is suggested from the XRD patterns that highly c-axis oriented films grow preferentially at low pressures and the growth of(100) planes are preferred at higher pressures. The SEM and AFM images both reveal that the deposition rate and the surface roughness decrease while the average grain size increases with increasing the sputtering pressure. XPS results show that lowering the sputtering pressure is a useful way to minimize the incorporation of oxygen atoms into the AlN films and hence a film with closer stoichiometric composition is obtained. From the measurement of nanomechanical properties of AlN thin films, the largest hardness and elastic modulus are obtained at 0.30 Pa. 展开更多
关键词 AlN thin film reactive magnetron sputtering preferred orientation nanomechanical properties
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Effect of bias voltage on compositional, mechanical and corrosion property of ZrNbAlN multilayer films by unbalanced magnetron sputtering 被引量:2
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作者 石永敬 潘复生 +2 位作者 鲍明东 潘虎成 Muhammad RASHAD 《Transactions of Nonferrous Metals Society of China》 SCIE EI CAS CSCD 2014年第9期2856-2863,共8页
Nano-scaled ZrNbAlN films with different negative bias voltages(Vb) were deposited on bronze substrate and Si(100) wafers by a reactive unbalanced magnetron sputtering technique. Composition and structure properti... Nano-scaled ZrNbAlN films with different negative bias voltages(Vb) were deposited on bronze substrate and Si(100) wafers by a reactive unbalanced magnetron sputtering technique. Composition and structure properties were characterized by X-ray photoelectron spectroscopy and X-ray diffraction. It is found that mole concentrations of Zr and Nb are affected by Vb, which leads to the increase of binding energy of N 1s and Al 2p and decrease of binding energy of Zr 3d5/2 and Nb 3d5/2. Surface morphologies evolution controlled by Vb could be observed. Furthermore, X-ray diffraction patterns reveal that these films show a(111) preferred orientation. Moreover, mechanical property and corrosion behavior of ZrNbAlN films were characterized by nanoindentation test and corrosion test, respectively. A maximum value of 21.85 GPa at-70 V occurs in the ZrNbAlN- bronze system, which outperforms uncoated bronze. Corrosion experiments in 0.5 mol/L NaCl and 0.5 mol/L HCl solution show that corrosion potential and corrosion current are dependent on Vb, and better anti-corrosion property could be obtained at-90 V. 展开更多
关键词 ZrNbAlN multilayer film magnetron sputtering COMPOSITION CORROSION
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Properties of W/DLC/W-S-C composite films fabricated by magnetron sputtering 被引量:2
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作者 代明江 韦春贝 +4 位作者 周克崧 朱敏 侯惠君 林松盛 佟鑫 《Transactions of Nonferrous Metals Society of China》 SCIE EI CAS CSCD 2015年第9期3002-3011,共10页
A kind of W/DLC/W-S-C composite film was fabricated by magnetron sputtering method.Effects of WSx content on the structure and the adhesion of the composite films were investigated.In addition,tribological behavior of... A kind of W/DLC/W-S-C composite film was fabricated by magnetron sputtering method.Effects of WSx content on the structure and the adhesion of the composite films were investigated.In addition,tribological behavior of the composite films was studied in the conditions of the ambient air and N2 gas atmosphere by ball-on-disk tester.The results indicate that the composite films show dense and amorphous microstructure.The WCx and WSx compounds are found in amorphous diamond like carbon matrix in the top layers of W-S-C.A proper WSx content is beneficial for improving the adhesion of the composite films.In air atmosphere,the composite films with high C content have better wear resistance and the friction coefficients range from 0.15 to 0.25.In N2 condition,high WSx content is benefit for the wear resistance and the friction coefficients of the composite films range from 0.03 to 0.1. 展开更多
关键词 W/DLC/W-S-C composite film magnetron sputtering adhesion strength friction coefficient
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