Electrostatic discharge(ESD)event usually destroys the electrical properties of dielectric films,resulting in product failure.In this work,the breakdown characteristic of machine mode(MM)ESD on three different nano si...Electrostatic discharge(ESD)event usually destroys the electrical properties of dielectric films,resulting in product failure.In this work,the breakdown characteristic of machine mode(MM)ESD on three different nano size films of head gimble assemble are obtained experimentally.The breakdown voltage and thickness parameters show a positive proportional relationship,but they are generally very low and have large discrete characteristics(~30%).The maximum and minimum breakdown voltages of the tested samples are 1.08 V and 0.46 V,which are far lower than the requirement of the current standard(25 V).In addition,the judgment criterion of product damage is given,and the relationship between discharge voltage polarity,initial resistance and breakdown voltage is studied.Finally,the theoretical analysis of the breakdown characteristic law has been given.展开更多
The further electrification of various fields in production and daily life makes it a topic worthy of exploration to improve the performance of capacitors for a long time,including thin-film capacitors.The discharge e...The further electrification of various fields in production and daily life makes it a topic worthy of exploration to improve the performance of capacitors for a long time,including thin-film capacitors.The discharge energy density of thin-film capacitors that serves as one of the important types directly depends on electric field strength and the dielectric constant of the insulation material.However,it has long been a great challenge to improve the breakdown strength and dielectric constant simultaneously.Considering that boron nitride nanosheets(BNNS)possess superior insulation and thermal conductivity owing to wide band gap and 2-dimensional structure,a bilayer polymer film is prepared via coating BNNS by solution casting on surface of polyethylene terephthalate(PET)films.By revealing the bandgap and insulating behavior with UV absorption spectrum,leakage current,and finite element calculation,it is manifested that nanocoating contributes to enhance the bandgap of polymer films,thereby suppressing the charge injection by redirecting their transport from electrodes.Worthy to note that an ultrahigh breakdown field strength(~736 MV m^(−1)),an excellent discharge energy density(~8.77 J cm^(−3))and a prominent charge-discharge efficiency(~96.51%)are achieved concurrently,which is ascribed to the contribution of BNNS ultrathin layer.In addition,the modified PET films also have superior comprehensive performance at high temperatures(~120°C).The materials and methods here selected are easily accessible and facile,which are suitable for large-scale roll-to-roll process production,and are of certain significance to explore the methods about film modification suitable for commercial promotion.展开更多
Aim To study the dielectric properties of diamond film. Methods Dielectric properties (the frequency dependenCe of conductance, permittivity, and loss factor) of diamond film preped by DC are plasma jet chemical vap...Aim To study the dielectric properties of diamond film. Methods Dielectric properties (the frequency dependenCe of conductance, permittivity, and loss factor) of diamond film preped by DC are plasma jet chemical vapor deposition (CVD) were studied. Resuls Dielectric properties of CVD diamond fAn depend mainly on its polycrystalline nature, and the presence of non-diamond disordered graphitic regions and impurities between diamond grains of the film. Annealing at 500℃ leads to the removal of greater part of disordered graphitic regions, but am not remove all disordered graphitic regions and impurities. Conclusion Much work nab to be done tO prepare or post-treat diamond films before using CVD diamond as a substrate for electronic devices.展开更多
Polyimide(PI)is a promising electronic packaging material,but it remains challenging to obtain an all-organic PI hybrid film with decreased dielectric constant and loss without modifying the monomer.Herein,a series of...Polyimide(PI)is a promising electronic packaging material,but it remains challenging to obtain an all-organic PI hybrid film with decreased dielectric constant and loss without modifying the monomer.Herein,a series of allorganic PI hybrid films were successfully prepared by introducing the covalent organic framework(COF),which could induce the formation of the cross-linking structure in the PI matrix.Due to the synergistic effects of the COF fillers and the cross-linking structure,the PI/COF hybrid film containing 2 wt%COF exhibited the lowest dielectric constant of 2.72 and the lowest dielectric loss(tanδ)of 0.0077 at 1 MHz.It is attributed to the intrinsic low dielectric constant of COF and a large number of mesopores within the PI.Besides,the cross-linking network of PI prevents the molecular chains from stacking and improves the fraction of free volume(FFV).The molecular dynamics simulation results are well consistent with the dielectric properties data.Furthermore,the PI/COF hybrid film with 5 wt%COF showed a significant enhancement in breakdown strength,which increased to 412.8 kV/mm as compared with pure PI.In addition,the PI/COF hybrid film achieve to reduce the dielectric constant and thermal expansion coefficient(CTE).It also exhibited excellent thermal,hydrophobicity,and mechanical performance.The all-organic PI/COF hybrid films have great commercial potential as next-generation electronic packaging materials.展开更多
Barium titanate（BTO） thin films were deposited on polycrystalline Ni foils by using the polymer assisted deposition（PAD） technique.The growth conditions including ambient and annealing temperatures were carefully ...Barium titanate（BTO） thin films were deposited on polycrystalline Ni foils by using the polymer assisted deposition（PAD） technique.The growth conditions including ambient and annealing temperatures were carefully optimized based on thermal dynamic analysis to control the oxidation processing and interdiffusion.Crystal structures,surface morphologies,and dielectric performance were examined and compared for BTO thin films annealed under different temperatures.Correlations between the fabrication conditions,microstructures,and dielectric properties were discussed.BTO thin films fabricated under the optimized conditions show good crystalline structure and promising dielectric properties with εr～ 400 and tan δ 〈 0.025 at 100 kHz.The data demonstrate that BTO films grown on polycrystalline Ni substrates by PAD are promising in device applications.展开更多
The experiment setup of a reflecting combination device, which has more advantages than a transmitting combination device, is designed in this study. To achieve angular spectrum selectivity, only one type of reflectiv...The experiment setup of a reflecting combination device, which has more advantages than a transmitting combination device, is designed in this study. To achieve angular spectrum selectivity, only one type of reflective component is needed,so difficulties of design and preparation are reduced. A dielectric multilayer film is applied to the reflective component, and the long wave-pass coating stacks of the structure are designed. To achieve high stopband transmittance and reduce electric field intensity at a wavelength of 1053 nm, an objective function is proposed for designing an optimized coating. The final optimized coating has good spectral characteristics and a high laser-induced damage threshold. A dielectric multilayer film with high reflectance plays an important role in preparing and applying a dielectric multilayer film reflecting cutoff filter-combination device.展开更多
A homogeneous atmospheric pressure dielectric barrier discharge is studied. It is in argon with small admixtures of titanium tetrachloride vapour and oxygen for the deposition of thin titania films on glass substrates...A homogeneous atmospheric pressure dielectric barrier discharge is studied. It is in argon with small admixtures of titanium tetrachloride vapour and oxygen for the deposition of thin titania films on glass substrates. A special electrode configuration was applied in order to deposit the titania film uniformly. The sustaining voltage （6 kV to 12 kV）, current density （about 3 mA/cm^2） and total optical emission spectroscopy were monitored to characterize the discharge in the gap of 2 mm. Typical deposition rates ranged from approximately 30 nm/min to 120 nm/min. The film morphology was investigated by using scanning electron microscopy （SEM） and the composition was determined with an energy dispersive x-ray spectroscopy （EDS） analysis tool attached to the SEM. The crystal structure and phase composition of the films were studied by x-ray diffraction （XRD）. Several parameters such as the discharge power, the ratio of carrier gas to the precursor gas, the deposition time on the crystallization behavior, the deposition rate and the surface morphology of the titania film were extensively studied.展开更多
The ion flow field on the ground is one of the significant parameters used to evaluate the electromagnetic environment of high voltage direct current（HVDC） power lines.HVDC lines may cross the greenhouses due to the...The ion flow field on the ground is one of the significant parameters used to evaluate the electromagnetic environment of high voltage direct current（HVDC） power lines.HVDC lines may cross the greenhouses due to the restricted transmission corridors.Under the condition of ion flow field,the dielectric films on the greenhouses will be charged,and the electric fields in the greenhouses may exceed the limit value.Field mills are widely used to measure the groundlevel direct current electric fields under the HVDC power lines.In this paper,the charge inversion method is applied to calculate the surface charges on the dielectric film according to the measured ground-level electric fields.The advantages of hiding the field mill probes in the ground are studied.The charge inversion algorithm is optimized in order to decrease the impact of measurement errors.Based on the experimental results,the surface charge distribution on a piece of quadrate dielectric film under a HVDC corona wire is studied.The enhanced effect of dielectric film on ground-level electric field is obviously weakened with the increase of film height.Compared with the total electric field strengths,the normal components of film-free electric fields at the corresponding film-placed positions have a higher effect on surface charge accumulation.展开更多
Plasma polymerized fluorocarbon （FC） films have been deposited on silicon substrates from dielectric barrier discharge （DBD） plasma of C4Fs at room temperature under a pressure of 25～125 Pa. The effects of the di...Plasma polymerized fluorocarbon （FC） films have been deposited on silicon substrates from dielectric barrier discharge （DBD） plasma of C4Fs at room temperature under a pressure of 25～125 Pa. The effects of the discharge pressure and frequency of power supply on the films have been systematically investigated. FC films with a less cross linked structure may be formed at a relatively high pressure. Increase in the frequency of power supply leads to a significant increase in the deposition rate. Static contact angle measurements show that deposited FC films have a stable, hydrophobic surface property. All deposited films show smooth surfaces with an atomic surface roughness. The relationship between plasma parameters and the properties of the deposited FC films are discussed.展开更多
Gd2O3 thin films as high-κ gate dielectrics were deposited directly on Si（001） substrates by magnetron sputtering at a pressure of 1.3 Pa and different temperatures. X-ray diffraction results revealed that all the ...Gd2O3 thin films as high-κ gate dielectrics were deposited directly on Si（001） substrates by magnetron sputtering at a pressure of 1.3 Pa and different temperatures. X-ray diffraction results revealed that all the films grown from 450 to 570 ℃ were crystalline, and the Gd2O3 thin films consisted of a mixture of cubic and monoclinic phases. The growth temperature was a critical parameter for the phase constituents and their relative amount. Low temperature was favorable for the formation of cubic phase while higher temperature gave rise to more monoclinic phase. All the Gd2O3 thin films grown from different temperatures exhibited acceptable electrical properties, such as low leakage current density （JL） of 10-5 A/cm^2 at zero bias with capacitance equivalent SiO2 thickness in the range of 6-13 nm. Through the comparison between films grown at 450 and 570 ℃, the existence of monoclinic phase caused an increase in JL by nearly one order of magnitude and a reduction of effective dielectric constant from 17 to 9.展开更多
Surface modification techniques with plasma are widely investigated to improve the surface insulation capability of polymers under dry conditions,while the relationship between treatment method,surface physical and ch...Surface modification techniques with plasma are widely investigated to improve the surface insulation capability of polymers under dry conditions,while the relationship between treatment method,surface physical and chemical properties,and wet flashover voltage is still unclear for inorganic ceramics.In this work,the surface insulation properties of ceramics under wet conditions are improved using nanosecond-pulsed dielectric barrier discharge with polydimethylsiloxane(PDMS)as the precursor.The relationships between PDMS concentration and the water contact angle,dry and wet flashover voltages are obtained to acquire the optimal concentration.The surface charge dissipation test and surface physio-chemical property measurement with SEM,AFM,XPS are carried out to further explore the mechanism of surface insulation enhancement.The results show that film deposition with micron thickness and superhydrophobicity occurs at the PDMS concentration of 1.5%.The dry flashover voltage is increased by 14.6%due to the induction of deep traps,while the wet flashover voltage is increased by 66.7%.The gap between dry-wet flashover voltage is decreased by 62.3%compared with the untreated one due to the self-cleaning effect.展开更多
Ti33O55 films are deposited with the help of an electron beam evaporator for their applications in metasurfaces. The film of subwavelength （632nm） thickness is deposited on a silicon substrate and annealed at 400℃....Ti33O55 films are deposited with the help of an electron beam evaporator for their applications in metasurfaces. The film of subwavelength （632nm） thickness is deposited on a silicon substrate and annealed at 400℃. The ellipsometry result shows a high refractive index above 2.5 with the minimum absorption coefficient in the visible region, which is necessary for high efficiency of transparent metasurfaces. Atomic force microscopy analysis is employed to measure the roughness of the as-deposited films. It is seen from micrographs that the deposited films are very smooth with the minimum roughness to prevent scattering and absorption losses for metasurface devices. The absence of grains and cracks can be seen by scanning electron microscope analysis, which is favorable for electron beam lithography. Fourier transform infrared spectroscopy reveals the transmission and reflection obtained from the film deposited on glass substrates. The as-deposited film shows high transmission above 60%, which is in good agreement with metasurfaces.展开更多
The fabrication of a-C:H films from methane has been performed using dielectric-barrier discharges at atmospheric pressure. The effect of combined-feed gas, such as carbon dioxide, carbon monoxide or acetylene on the ...The fabrication of a-C:H films from methane has been performed using dielectric-barrier discharges at atmospheric pressure. The effect of combined-feed gas, such as carbon dioxide, carbon monoxide or acetylene on the formation of a-C:H films has been investigated. It has been demonstrated that the addition of carbon monoxide or acetylene into methane leads to a remarkable improvement in the fabrication of a-C:H films. The characterization of carbon film obtained has been conducted using FT-IR, Raman and SEM.展开更多
With the advent of the 5 G era,advanced packaging applications such as wafer-level fan-out packaging have emerged thanks to efforts to reduce signal loss and increase signal transmission rates.As one of the key materi...With the advent of the 5 G era,advanced packaging applications such as wafer-level fan-out packaging have emerged thanks to efforts to reduce signal loss and increase signal transmission rates.As one of the key materials employed in telecommunication devices,the interlayer dielectric material directly affects signal transmission and device reliability.Among them,polyimide(PI)has become an important interlayer dielectric material because of its excellent comprehensive properties.However,in order to meet the needs high-frequency and high-speed circuits for 5 G networks,it will be necessary to further reduce the dielectric constant and dielectric loss of PI.PI is widely used as a flexible dielectric material due to its excellent electrical insulation properties(dielectric constant≈3.0-4.0,dielectric loss≈0.02),mechanical properties,and thermal resistance.However,further reduction in the dielectric constant will be needed in order for PI-based materials to better meet the current high integration development needs of the microelectronics industry.This article starts from strategies to prepare low dielectric PI that have been developed in the last decade,based on a more systematic and inductive analysis,and prospects the development potential of low dielectric PI.展开更多
The low-k carbon doped silica film has been modified by radio frequency helium plasma at 5 Pa pressure and 80 W power with subsequent XPS, FTIR and optical emission spec- troscopy analysis. XPS data indicate that heli...The low-k carbon doped silica film has been modified by radio frequency helium plasma at 5 Pa pressure and 80 W power with subsequent XPS, FTIR and optical emission spec- troscopy analysis. XPS data indicate that helium ions have broken Si-C bonds, leading to Si-C scission with C（1s） lost seriously. The Si（2p）, O（ls）, peak obviously shifted to higher binding en- ergies, indicating an increasingly oxidized Si（2p）. FTIR data also show that the silanol formation increased with longer exposure time up to a week. Contrarily, the CHa stretch, Si-C stretching bond and the ratio of the Si-O-Si cage and Si-O-Si network peak sharply decreased upon exposure to helium plasma. The OES result indicates that monovalent helium ions in plasma play a key role in damaging carbon doped silica film. So it can be concluded that the monovalent helium ions besides VUV photons can break the weak Si-C bonds to create Si dangling bonds and free methyl radicals, and the latter easily reacts with O_2 from the atmosphere to generate CO_2 and H_2O. The bonds change is due to the Si dangling bonds combining with H_2O, thereby, increasing the dielectric constant k value.展开更多
By taking into account structural transition zones near the lateral and thickness direction edges,this paper uses a modified transverse Ising model to study dielectric properties of a finite size ferroelectric thin fi...By taking into account structural transition zones near the lateral and thickness direction edges,this paper uses a modified transverse Ising model to study dielectric properties of a finite size ferroelectric thin film in the framework of the mean-field approximation.The results indicate that the influence of the lateral size on the dielectric susceptibility cannot be neglected and lateral structural transition zones could be a crucial factor that improves the mean susceptibility of the fixed size film.展开更多
Low-pressure dielectric barrier discharge（DBD） TiCl4/O2and N2 plasmas have been used to deposit titanium oxide films at different power supply driving frequencies. A homemade large area low pressure DBD reactor was ...Low-pressure dielectric barrier discharge（DBD） TiCl4/O2and N2 plasmas have been used to deposit titanium oxide films at different power supply driving frequencies. A homemade large area low pressure DBD reactor was applied, characterized by the simplicity of the experimental set-up and a low consumption of feed gas and electric power, as well as being easy to operate. Atomic force microscopy, scanning electron microscopy, energy dispersive spectroscopy,and contact angle measurements have been used to characterize the deposited films. Experimental results show all deposited films are uniform and hydrophilic with a contact angle of about 15 o.Compared to titanium oxide films deposited in TiCl4/O2gas mixtures, those in TiCl4/O2/N2gas mixtures are much more stable. The contact angle of titanium oxide films in TiCl4/O2/N2gas mixtures with the addition of 50% N2 and 20% TiCl4 is still smaller than 20 o, while that of undoped titanium oxide films is larger than 64 owhen they are measured after one week. The low-pressure TiCl4/O2plasmas consist of pulsed glow-like discharges with peak widths of several microseconds, which leads to the uniform deposition of titanium oxide films. Increasing a film thickness over several hundreds of nm leads to the film’s fragmentation due to the over-high film stress. Optical emission spectra（OES） of TiCl4/O2DBD plasmas at various power supply driving frequencies are presented.展开更多
Here I will review recent progress on the study of dielectric SrTiO3 （STO） thin films. In our work, laser molecular beam epitaxy has been used to prepare multilayer heterostructures consisting of dielectric STO and ...Here I will review recent progress on the study of dielectric SrTiO3 （STO） thin films. In our work, laser molecular beam epitaxy has been used to prepare multilayer heterostructures consisting of dielectric STO and high temperature superconducting YBa2Cu3Oy （YBCO） thin films for tunable applications. Since the tunability of the dielectric constant and dielectric loss of STO are the key parameters determining the performance of tunable devices and hence the feasibility of this technology, the correlations between the deposition parameters of STO thin films, their structural characteristics, and dielectric properties were studied. An enhanced tunability of 74.7%, comparable to that of STO single-crystal, was observed in our grown STO thin films suitable for tunable YBCO applications. On the other hand, we have grown epitaxial STO （110） films on Si without any buffer layer. The nature of epitaxial growth and interfacial structures of the grown films were examined by various techniques, such as Laue diffraction, high-resolution transmission electron microscopy （HRTEM） and x-ray photoelectron spectroscopy. The in-plane alignments for the STO （110） films grown directly on Si （100） was found as STO//Si and STO//Si . HRTEM study has showed a crystalline transition across the STO/Si interface, indicating it is free from any amorphous oxide layer. We provide clear evidence that the interface mainly consists of Sr silicate phase. The results suggest that such Sr silicate interfacial layer exhibits favourable structural and chemical properties that are particularly useful for epitaxial STO （110） growth on Si. Such STO thin films will be useful for practical applications.展开更多
Many distinguished properties of epitaxial ferroelectric thin films can be tunable through the misfit strain.The strain tunability of ferroelectric and dielectric properties in epitaxial lead titanate ultrathin films ...Many distinguished properties of epitaxial ferroelectric thin films can be tunable through the misfit strain.The strain tunability of ferroelectric and dielectric properties in epitaxial lead titanate ultrathin films is numerically investigated by using a phase field model,in which the surface effect of polarization is taken into account.The response of polarization to the applied electric field in the thickness direction is examined with different misfit strains at room temperature.It is found that a compressive misfit strain increases the coercive field and the remanent polarization while a tensile misfit strain decreases both of them.The nonlinear dielectric constants of the thin films with tensile misfit strains are much larger than those of the thin films without misfit strains,which are attributed to the existence of the a/c/a/c multiple domains in the thin films under tensile misfit strains.展开更多
An efficient interface modification is introduced to improve the performance of polymeric thin film transistors. This efficient interface modification is first achieved by 4-fluorothiophenol（4-FTP） self-assembled mo...An efficient interface modification is introduced to improve the performance of polymeric thin film transistors. This efficient interface modification is first achieved by 4-fluorothiophenol（4-FTP） self-assembled monolayers（SAM） to chemically treat the silver source–drain（S/D） contacts while the silicon oxide（SiO2） dielectric interface is further primed by either hexamethyldisilazane（HMDS） or octyltrichlorosilane（OTS-C8）. Results show that contact resistance is the dominant factor that limits the field effect mobility of the PTDPPTFT4 transistors. With proper surface modification applied to both the dielectric surface and the bottom contacts, the field effect mobilities of the bottom-gate bottom-contact PTDPPTFT4 transistors were significantly improved from 0.15 cm^2·V^-1·s^-1 to 0.91 cm^2·V^-1·s^-1.展开更多
文摘Electrostatic discharge(ESD)event usually destroys the electrical properties of dielectric films,resulting in product failure.In this work,the breakdown characteristic of machine mode(MM)ESD on three different nano size films of head gimble assemble are obtained experimentally.The breakdown voltage and thickness parameters show a positive proportional relationship,but they are generally very low and have large discrete characteristics(~30%).The maximum and minimum breakdown voltages of the tested samples are 1.08 V and 0.46 V,which are far lower than the requirement of the current standard(25 V).In addition,the judgment criterion of product damage is given,and the relationship between discharge voltage polarity,initial resistance and breakdown voltage is studied.Finally,the theoretical analysis of the breakdown characteristic law has been given.
基金supported by the National Natural Science Foundation of China(Grant Nos.51937007,and 51921005)National Key Research and Development Program of China(No.2021YFB2401502).
文摘The further electrification of various fields in production and daily life makes it a topic worthy of exploration to improve the performance of capacitors for a long time,including thin-film capacitors.The discharge energy density of thin-film capacitors that serves as one of the important types directly depends on electric field strength and the dielectric constant of the insulation material.However,it has long been a great challenge to improve the breakdown strength and dielectric constant simultaneously.Considering that boron nitride nanosheets(BNNS)possess superior insulation and thermal conductivity owing to wide band gap and 2-dimensional structure,a bilayer polymer film is prepared via coating BNNS by solution casting on surface of polyethylene terephthalate(PET)films.By revealing the bandgap and insulating behavior with UV absorption spectrum,leakage current,and finite element calculation,it is manifested that nanocoating contributes to enhance the bandgap of polymer films,thereby suppressing the charge injection by redirecting their transport from electrodes.Worthy to note that an ultrahigh breakdown field strength(~736 MV m^(−1)),an excellent discharge energy density(~8.77 J cm^(−3))and a prominent charge-discharge efficiency(~96.51%)are achieved concurrently,which is ascribed to the contribution of BNNS ultrathin layer.In addition,the modified PET films also have superior comprehensive performance at high temperatures(~120°C).The materials and methods here selected are easily accessible and facile,which are suitable for large-scale roll-to-roll process production,and are of certain significance to explore the methods about film modification suitable for commercial promotion.
文摘Aim To study the dielectric properties of diamond film. Methods Dielectric properties (the frequency dependenCe of conductance, permittivity, and loss factor) of diamond film preped by DC are plasma jet chemical vapor deposition (CVD) were studied. Resuls Dielectric properties of CVD diamond fAn depend mainly on its polycrystalline nature, and the presence of non-diamond disordered graphitic regions and impurities between diamond grains of the film. Annealing at 500℃ leads to the removal of greater part of disordered graphitic regions, but am not remove all disordered graphitic regions and impurities. Conclusion Much work nab to be done tO prepare or post-treat diamond films before using CVD diamond as a substrate for electronic devices.
基金supported by National Natural Science Foundation of China(52103029 and 51903075).
文摘Polyimide(PI)is a promising electronic packaging material,but it remains challenging to obtain an all-organic PI hybrid film with decreased dielectric constant and loss without modifying the monomer.Herein,a series of allorganic PI hybrid films were successfully prepared by introducing the covalent organic framework(COF),which could induce the formation of the cross-linking structure in the PI matrix.Due to the synergistic effects of the COF fillers and the cross-linking structure,the PI/COF hybrid film containing 2 wt%COF exhibited the lowest dielectric constant of 2.72 and the lowest dielectric loss(tanδ)of 0.0077 at 1 MHz.It is attributed to the intrinsic low dielectric constant of COF and a large number of mesopores within the PI.Besides,the cross-linking network of PI prevents the molecular chains from stacking and improves the fraction of free volume(FFV).The molecular dynamics simulation results are well consistent with the dielectric properties data.Furthermore,the PI/COF hybrid film with 5 wt%COF showed a significant enhancement in breakdown strength,which increased to 412.8 kV/mm as compared with pure PI.In addition,the PI/COF hybrid film achieve to reduce the dielectric constant and thermal expansion coefficient(CTE).It also exhibited excellent thermal,hydrophobicity,and mechanical performance.The all-organic PI/COF hybrid films have great commercial potential as next-generation electronic packaging materials.
基金Project supported by the National Natural Science Foundation of China (Grant Nos. 11028409 and 60976061)the Fundamental Research Funds for the Central Universities of China (Grant No. ZYGX2009Z0001)
文摘Barium titanate（BTO） thin films were deposited on polycrystalline Ni foils by using the polymer assisted deposition（PAD） technique.The growth conditions including ambient and annealing temperatures were carefully optimized based on thermal dynamic analysis to control the oxidation processing and interdiffusion.Crystal structures,surface morphologies,and dielectric performance were examined and compared for BTO thin films annealed under different temperatures.Correlations between the fabrication conditions,microstructures,and dielectric properties were discussed.BTO thin films fabricated under the optimized conditions show good crystalline structure and promising dielectric properties with εr～ 400 and tan δ 〈 0.025 at 100 kHz.The data demonstrate that BTO films grown on polycrystalline Ni substrates by PAD are promising in device applications.
文摘The experiment setup of a reflecting combination device, which has more advantages than a transmitting combination device, is designed in this study. To achieve angular spectrum selectivity, only one type of reflective component is needed,so difficulties of design and preparation are reduced. A dielectric multilayer film is applied to the reflective component, and the long wave-pass coating stacks of the structure are designed. To achieve high stopband transmittance and reduce electric field intensity at a wavelength of 1053 nm, an objective function is proposed for designing an optimized coating. The final optimized coating has good spectral characteristics and a high laser-induced damage threshold. A dielectric multilayer film with high reflectance plays an important role in preparing and applying a dielectric multilayer film reflecting cutoff filter-combination device.
基金supported by the Science Council of Shanghai (No. 0352 nm035)
文摘A homogeneous atmospheric pressure dielectric barrier discharge is studied. It is in argon with small admixtures of titanium tetrachloride vapour and oxygen for the deposition of thin titania films on glass substrates. A special electrode configuration was applied in order to deposit the titania film uniformly. The sustaining voltage （6 kV to 12 kV）, current density （about 3 mA/cm^2） and total optical emission spectroscopy were monitored to characterize the discharge in the gap of 2 mm. Typical deposition rates ranged from approximately 30 nm/min to 120 nm/min. The film morphology was investigated by using scanning electron microscopy （SEM） and the composition was determined with an energy dispersive x-ray spectroscopy （EDS） analysis tool attached to the SEM. The crystal structure and phase composition of the films were studied by x-ray diffraction （XRD）. Several parameters such as the discharge power, the ratio of carrier gas to the precursor gas, the deposition time on the crystallization behavior, the deposition rate and the surface morphology of the titania film were extensively studied.
基金supported by the National Key Research and Development Program(Grant No.2016YFB0900900)National Natural Science Foundation of China(Grant No.51577064)
文摘The ion flow field on the ground is one of the significant parameters used to evaluate the electromagnetic environment of high voltage direct current（HVDC） power lines.HVDC lines may cross the greenhouses due to the restricted transmission corridors.Under the condition of ion flow field,the dielectric films on the greenhouses will be charged,and the electric fields in the greenhouses may exceed the limit value.Field mills are widely used to measure the groundlevel direct current electric fields under the HVDC power lines.In this paper,the charge inversion method is applied to calculate the surface charges on the dielectric film according to the measured ground-level electric fields.The advantages of hiding the field mill probes in the ground are studied.The charge inversion algorithm is optimized in order to decrease the impact of measurement errors.Based on the experimental results,the surface charge distribution on a piece of quadrate dielectric film under a HVDC corona wire is studied.The enhanced effect of dielectric film on ground-level electric field is obviously weakened with the increase of film height.Compared with the total electric field strengths,the normal components of film-free electric fields at the corresponding film-placed positions have a higher effect on surface charge accumulation.
基金National Natural Science Foundation of China(No.10405005)
文摘Plasma polymerized fluorocarbon （FC） films have been deposited on silicon substrates from dielectric barrier discharge （DBD） plasma of C4Fs at room temperature under a pressure of 25～125 Pa. The effects of the discharge pressure and frequency of power supply on the films have been systematically investigated. FC films with a less cross linked structure may be formed at a relatively high pressure. Increase in the frequency of power supply leads to a significant increase in the deposition rate. Static contact angle measurements show that deposited FC films have a stable, hydrophobic surface property. All deposited films show smooth surfaces with an atomic surface roughness. The relationship between plasma parameters and the properties of the deposited FC films are discussed.
基金General Research Institute for Nonferrous Metals Research Fund (82262)
文摘Gd2O3 thin films as high-κ gate dielectrics were deposited directly on Si（001） substrates by magnetron sputtering at a pressure of 1.3 Pa and different temperatures. X-ray diffraction results revealed that all the films grown from 450 to 570 ℃ were crystalline, and the Gd2O3 thin films consisted of a mixture of cubic and monoclinic phases. The growth temperature was a critical parameter for the phase constituents and their relative amount. Low temperature was favorable for the formation of cubic phase while higher temperature gave rise to more monoclinic phase. All the Gd2O3 thin films grown from different temperatures exhibited acceptable electrical properties, such as low leakage current density （JL） of 10-5 A/cm^2 at zero bias with capacitance equivalent SiO2 thickness in the range of 6-13 nm. Through the comparison between films grown at 450 and 570 ℃, the existence of monoclinic phase caused an increase in JL by nearly one order of magnitude and a reduction of effective dielectric constant from 17 to 9.
基金partially supported by National Natural Science Foundation of China(Nos.51977104,52037004 and 52207160)the Natural Science Foundation of Jiangsu Province(No.BK20220341)。
文摘Surface modification techniques with plasma are widely investigated to improve the surface insulation capability of polymers under dry conditions,while the relationship between treatment method,surface physical and chemical properties,and wet flashover voltage is still unclear for inorganic ceramics.In this work,the surface insulation properties of ceramics under wet conditions are improved using nanosecond-pulsed dielectric barrier discharge with polydimethylsiloxane(PDMS)as the precursor.The relationships between PDMS concentration and the water contact angle,dry and wet flashover voltages are obtained to acquire the optimal concentration.The surface charge dissipation test and surface physio-chemical property measurement with SEM,AFM,XPS are carried out to further explore the mechanism of surface insulation enhancement.The results show that film deposition with micron thickness and superhydrophobicity occurs at the PDMS concentration of 1.5%.The dry flashover voltage is increased by 14.6%due to the induction of deep traps,while the wet flashover voltage is increased by 66.7%.The gap between dry-wet flashover voltage is decreased by 62.3%compared with the untreated one due to the self-cleaning effect.
基金Information Technology University of the Punjab, Lahore, Pakistan for financial supportthe financial support by Engineering Research Center Program(NRF-2015R1A5A1037668)+1 种基金global Ph.D. fellowship(NRF-2016H1A2A1906519)the KRF fellowship(NRF-2017H1D3A1A02011379)through the National Research Foundation of Korea (NRF) funded by the Ministry of Science, ICT and Future Planning (MSIP) of Korean government
文摘Ti33O55 films are deposited with the help of an electron beam evaporator for their applications in metasurfaces. The film of subwavelength （632nm） thickness is deposited on a silicon substrate and annealed at 400℃. The ellipsometry result shows a high refractive index above 2.5 with the minimum absorption coefficient in the visible region, which is necessary for high efficiency of transparent metasurfaces. Atomic force microscopy analysis is employed to measure the roughness of the as-deposited films. It is seen from micrographs that the deposited films are very smooth with the minimum roughness to prevent scattering and absorption losses for metasurface devices. The absence of grains and cracks can be seen by scanning electron microscope analysis, which is favorable for electron beam lithography. Fourier transform infrared spectroscopy reveals the transmission and reflection obtained from the film deposited on glass substrates. The as-deposited film shows high transmission above 60%, which is in good agreement with metasurfaces.
基金The project supported by the Key Foundation of Tianjin City Committee of Science Technology and ABB Corporate Research Ltd., Switzerland
文摘The fabrication of a-C:H films from methane has been performed using dielectric-barrier discharges at atmospheric pressure. The effect of combined-feed gas, such as carbon dioxide, carbon monoxide or acetylene on the formation of a-C:H films has been investigated. It has been demonstrated that the addition of carbon monoxide or acetylene into methane leads to a remarkable improvement in the fabrication of a-C:H films. The characterization of carbon film obtained has been conducted using FT-IR, Raman and SEM.
基金supported by Department of Education of Liaoning Province(LQ2019004 and LZ2019005).
文摘With the advent of the 5 G era,advanced packaging applications such as wafer-level fan-out packaging have emerged thanks to efforts to reduce signal loss and increase signal transmission rates.As one of the key materials employed in telecommunication devices,the interlayer dielectric material directly affects signal transmission and device reliability.Among them,polyimide(PI)has become an important interlayer dielectric material because of its excellent comprehensive properties.However,in order to meet the needs high-frequency and high-speed circuits for 5 G networks,it will be necessary to further reduce the dielectric constant and dielectric loss of PI.PI is widely used as a flexible dielectric material due to its excellent electrical insulation properties(dielectric constant≈3.0-4.0,dielectric loss≈0.02),mechanical properties,and thermal resistance.However,further reduction in the dielectric constant will be needed in order for PI-based materials to better meet the current high integration development needs of the microelectronics industry.This article starts from strategies to prepare low dielectric PI that have been developed in the last decade,based on a more systematic and inductive analysis,and prospects the development potential of low dielectric PI.
基金supported by Shenyang Science and Technology Plan of China(No.F12028200)
文摘The low-k carbon doped silica film has been modified by radio frequency helium plasma at 5 Pa pressure and 80 W power with subsequent XPS, FTIR and optical emission spec- troscopy analysis. XPS data indicate that helium ions have broken Si-C bonds, leading to Si-C scission with C（1s） lost seriously. The Si（2p）, O（ls）, peak obviously shifted to higher binding en- ergies, indicating an increasingly oxidized Si（2p）. FTIR data also show that the silanol formation increased with longer exposure time up to a week. Contrarily, the CHa stretch, Si-C stretching bond and the ratio of the Si-O-Si cage and Si-O-Si network peak sharply decreased upon exposure to helium plasma. The OES result indicates that monovalent helium ions in plasma play a key role in damaging carbon doped silica film. So it can be concluded that the monovalent helium ions besides VUV photons can break the weak Si-C bonds to create Si dangling bonds and free methyl radicals, and the latter easily reacts with O_2 from the atmosphere to generate CO_2 and H_2O. The bonds change is due to the Si dangling bonds combining with H_2O, thereby, increasing the dielectric constant k value.
文摘By taking into account structural transition zones near the lateral and thickness direction edges,this paper uses a modified transverse Ising model to study dielectric properties of a finite size ferroelectric thin film in the framework of the mean-field approximation.The results indicate that the influence of the lateral size on the dielectric susceptibility cannot be neglected and lateral structural transition zones could be a crucial factor that improves the mean susceptibility of the fixed size film.
基金supported by National Natural Science Foundation of China(Nos.10875025 and 20803007)Fundamental Research Funds for Central Universities of China(Nos.DC12010116 and DC13010106)Program for Liaoning Excellent Talents in University(LJQ20l3128)
文摘Low-pressure dielectric barrier discharge（DBD） TiCl4/O2and N2 plasmas have been used to deposit titanium oxide films at different power supply driving frequencies. A homemade large area low pressure DBD reactor was applied, characterized by the simplicity of the experimental set-up and a low consumption of feed gas and electric power, as well as being easy to operate. Atomic force microscopy, scanning electron microscopy, energy dispersive spectroscopy,and contact angle measurements have been used to characterize the deposited films. Experimental results show all deposited films are uniform and hydrophilic with a contact angle of about 15 o.Compared to titanium oxide films deposited in TiCl4/O2gas mixtures, those in TiCl4/O2/N2gas mixtures are much more stable. The contact angle of titanium oxide films in TiCl4/O2/N2gas mixtures with the addition of 50% N2 and 20% TiCl4 is still smaller than 20 o, while that of undoped titanium oxide films is larger than 64 owhen they are measured after one week. The low-pressure TiCl4/O2plasmas consist of pulsed glow-like discharges with peak widths of several microseconds, which leads to the uniform deposition of titanium oxide films. Increasing a film thickness over several hundreds of nm leads to the film’s fragmentation due to the over-high film stress. Optical emission spectra（OES） of TiCl4/O2DBD plasmas at various power supply driving frequencies are presented.
文摘Here I will review recent progress on the study of dielectric SrTiO3 （STO） thin films. In our work, laser molecular beam epitaxy has been used to prepare multilayer heterostructures consisting of dielectric STO and high temperature superconducting YBa2Cu3Oy （YBCO） thin films for tunable applications. Since the tunability of the dielectric constant and dielectric loss of STO are the key parameters determining the performance of tunable devices and hence the feasibility of this technology, the correlations between the deposition parameters of STO thin films, their structural characteristics, and dielectric properties were studied. An enhanced tunability of 74.7%, comparable to that of STO single-crystal, was observed in our grown STO thin films suitable for tunable YBCO applications. On the other hand, we have grown epitaxial STO （110） films on Si without any buffer layer. The nature of epitaxial growth and interfacial structures of the grown films were examined by various techniques, such as Laue diffraction, high-resolution transmission electron microscopy （HRTEM） and x-ray photoelectron spectroscopy. The in-plane alignments for the STO （110） films grown directly on Si （100） was found as STO//Si and STO//Si . HRTEM study has showed a crystalline transition across the STO/Si interface, indicating it is free from any amorphous oxide layer. We provide clear evidence that the interface mainly consists of Sr silicate phase. The results suggest that such Sr silicate interfacial layer exhibits favourable structural and chemical properties that are particularly useful for epitaxial STO （110） growth on Si. Such STO thin films will be useful for practical applications.
基金the financial support from the National Nature Science Foundation of China (Grants Nos.11002123 and 10832009)Zhejiang Provincial Qianjiang Talent Fund(E9027)Key Innovation Fund(2009R50025)
文摘Many distinguished properties of epitaxial ferroelectric thin films can be tunable through the misfit strain.The strain tunability of ferroelectric and dielectric properties in epitaxial lead titanate ultrathin films is numerically investigated by using a phase field model,in which the surface effect of polarization is taken into account.The response of polarization to the applied electric field in the thickness direction is examined with different misfit strains at room temperature.It is found that a compressive misfit strain increases the coercive field and the remanent polarization while a tensile misfit strain decreases both of them.The nonlinear dielectric constants of the thin films with tensile misfit strains are much larger than those of the thin films without misfit strains,which are attributed to the existence of the a/c/a/c multiple domains in the thin films under tensile misfit strains.
基金Project supported by the National Basic Research Program of China(Grant No.2013CB328803)
文摘An efficient interface modification is introduced to improve the performance of polymeric thin film transistors. This efficient interface modification is first achieved by 4-fluorothiophenol（4-FTP） self-assembled monolayers（SAM） to chemically treat the silver source–drain（S/D） contacts while the silicon oxide（SiO2） dielectric interface is further primed by either hexamethyldisilazane（HMDS） or octyltrichlorosilane（OTS-C8）. Results show that contact resistance is the dominant factor that limits the field effect mobility of the PTDPPTFT4 transistors. With proper surface modification applied to both the dielectric surface and the bottom contacts, the field effect mobilities of the bottom-gate bottom-contact PTDPPTFT4 transistors were significantly improved from 0.15 cm^2·V^-1·s^-1 to 0.91 cm^2·V^-1·s^-1.
